Multilayer dielectric diffraction gratings
Abstract
The design and fabrication of dielectric grating structures with high diffraction efficiency used in reflection or transmission is described. By forming a multilayer structure of alternating index dielectric materials and placing a grating structure on top of the multilayer, a diffraction grating of adjustable efficiency, and variable optical bandwidth can be obtained. Diffraction efficiency into the first order in reflection varying between 1 and 98 percent has been achieved by controlling the design of the multilayer and the depth, shape, and material comprising the grooves of the grating structure. Methods for fabricating these gratings without the use of ion etching techniques are described.
- Inventors:
-
- Livermore, CA
- Oakley, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 872305
- Patent Number(s):
- 5907436
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- multilayer; dielectric; diffraction; gratings; design; fabrication; grating; structures; efficiency; reflection; transmission; described; forming; structure; alternating; index; materials; placing; top; adjustable; variable; optical; bandwidth; obtained; varying; 98; percent; achieved; controlling; depth; shape; material; comprising; grooves; methods; fabricating; etching; techniques; multilayer dielectric; dielectric materials; material comprising; diffraction grating; dielectric material; multilayer structure; grating structure; etching techniques; diffraction gratings; diffraction efficiency; grating structures; optical band; /359/430/
Citation Formats
Perry, Michael D, Britten, Jerald A, Nguyen, Hoang T, Boyd, Robert, and Shore, Bruce W. Multilayer dielectric diffraction gratings. United States: N. p., 1999.
Web.
Perry, Michael D, Britten, Jerald A, Nguyen, Hoang T, Boyd, Robert, & Shore, Bruce W. Multilayer dielectric diffraction gratings. United States.
Perry, Michael D, Britten, Jerald A, Nguyen, Hoang T, Boyd, Robert, and Shore, Bruce W. Fri .
"Multilayer dielectric diffraction gratings". United States. https://www.osti.gov/servlets/purl/872305.
@article{osti_872305,
title = {Multilayer dielectric diffraction gratings},
author = {Perry, Michael D and Britten, Jerald A and Nguyen, Hoang T and Boyd, Robert and Shore, Bruce W},
abstractNote = {The design and fabrication of dielectric grating structures with high diffraction efficiency used in reflection or transmission is described. By forming a multilayer structure of alternating index dielectric materials and placing a grating structure on top of the multilayer, a diffraction grating of adjustable efficiency, and variable optical bandwidth can be obtained. Diffraction efficiency into the first order in reflection varying between 1 and 98 percent has been achieved by controlling the design of the multilayer and the depth, shape, and material comprising the grooves of the grating structure. Methods for fabricating these gratings without the use of ion etching techniques are described.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {1}
}
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Works referenced in this record:
Infrared light scattering from surfaces covered with multiple dielectric overlayers
journal, January 1977
- Elson, J. M.
- Applied Optics, Vol. 16, Issue 11