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Title: Virtual mask digital electron beam lithography

Abstract

Systems and methods for direct-to-digital holography are described. An apparatus includes a laser; a beamsplitter optically coupled to the laser; a reference beam mirror optically coupled to the beamsplitter; an object optically coupled to the beamsplitter, a focusing lens optically coupled to both the reference beam mirror and the object; and a digital recorder optically coupled to the focusing lens. A reference beam is incident upon the reference beam mirror at a non-normal angle, and the reference beam and an object beam are focused by the focusing lens at a focal plane of the digital recorder to form an image. The systems and methods provide advantages in that computer assisted holographic measurements can be made.

Inventors:
 [1];  [2];  [3];  [4];  [2];  [2]
  1. (Farragut, TN)
  2. (Knoxville, TN)
  3. (Oak Ridge, TN)
  4. (Powell, TN)
Issue Date:
Research Org.:
LOCKHEED MARTIN ENERGY RES COR
OSTI Identifier:
872245
Patent Number(s):
5892231
Assignee:
Lockheed Martin Energy Research Corporation (Oakridge, TN) ORNL
DOE Contract Number:  
AC05-96OR22464
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
virtual; mask; digital; electron; beam; lithography; systems; methods; direct-to-digital; holography; described; apparatus; laser; beamsplitter; optically; coupled; reference; mirror; focusing; lens; recorder; incident; non-normal; angle; focused; focal; plane; form; image; provide; advantages; computer; assisted; holographic; measurements; beam mirror; focusing lens; reference beam; electron beam; optically coupled; focal plane; provide advantages; methods provide; lithography systems; computer assisted; mirror optically; direct-to-digital holography; beam lithography; beamsplitter optically; /250/

Citation Formats

Baylor, Larry R., Thomas, Clarence E., Voelkl, Edgar, Moore, James A., Simpson, Michael L., and Paulus, Michael J. Virtual mask digital electron beam lithography. United States: N. p., 1999. Web.
Baylor, Larry R., Thomas, Clarence E., Voelkl, Edgar, Moore, James A., Simpson, Michael L., & Paulus, Michael J. Virtual mask digital electron beam lithography. United States.
Baylor, Larry R., Thomas, Clarence E., Voelkl, Edgar, Moore, James A., Simpson, Michael L., and Paulus, Michael J. Fri . "Virtual mask digital electron beam lithography". United States. https://www.osti.gov/servlets/purl/872245.
@article{osti_872245,
title = {Virtual mask digital electron beam lithography},
author = {Baylor, Larry R. and Thomas, Clarence E. and Voelkl, Edgar and Moore, James A. and Simpson, Michael L. and Paulus, Michael J.},
abstractNote = {Systems and methods for direct-to-digital holography are described. An apparatus includes a laser; a beamsplitter optically coupled to the laser; a reference beam mirror optically coupled to the beamsplitter; an object optically coupled to the beamsplitter, a focusing lens optically coupled to both the reference beam mirror and the object; and a digital recorder optically coupled to the focusing lens. A reference beam is incident upon the reference beam mirror at a non-normal angle, and the reference beam and an object beam are focused by the focusing lens at a focal plane of the digital recorder to form an image. The systems and methods provide advantages in that computer assisted holographic measurements can be made.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {1}
}

Patent:

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