Virtual mask digital electron beam lithography
Abstract
Systems and methods for direct-to-digital holography are described. An apparatus includes a laser; a beamsplitter optically coupled to the laser; a reference beam mirror optically coupled to the beamsplitter; an object optically coupled to the beamsplitter, a focusing lens optically coupled to both the reference beam mirror and the object; and a digital recorder optically coupled to the focusing lens. A reference beam is incident upon the reference beam mirror at a non-normal angle, and the reference beam and an object beam are focused by the focusing lens at a focal plane of the digital recorder to form an image. The systems and methods provide advantages in that computer assisted holographic measurements can be made.
- Inventors:
-
- Farragut, TN
- Knoxville, TN
- Oak Ridge, TN
- Powell, TN
- Issue Date:
- Research Org.:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- OSTI Identifier:
- 872245
- Patent Number(s):
- 5892231
- Assignee:
- Lockheed Martin Energy Research Corporation (Oakridge, TN)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- AC05-96OR22464
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- virtual; mask; digital; electron; beam; lithography; systems; methods; direct-to-digital; holography; described; apparatus; laser; beamsplitter; optically; coupled; reference; mirror; focusing; lens; recorder; incident; non-normal; angle; focused; focal; plane; form; image; provide; advantages; computer; assisted; holographic; measurements; beam mirror; focusing lens; reference beam; electron beam; optically coupled; focal plane; provide advantages; methods provide; lithography systems; computer assisted; mirror optically; direct-to-digital holography; beam lithography; beamsplitter optically; /250/
Citation Formats
Baylor, Larry R, Thomas, Clarence E, Voelkl, Edgar, Moore, James A, Simpson, Michael L, and Paulus, Michael J. Virtual mask digital electron beam lithography. United States: N. p., 1999.
Web.
Baylor, Larry R, Thomas, Clarence E, Voelkl, Edgar, Moore, James A, Simpson, Michael L, & Paulus, Michael J. Virtual mask digital electron beam lithography. United States.
Baylor, Larry R, Thomas, Clarence E, Voelkl, Edgar, Moore, James A, Simpson, Michael L, and Paulus, Michael J. Fri .
"Virtual mask digital electron beam lithography". United States. https://www.osti.gov/servlets/purl/872245.
@article{osti_872245,
title = {Virtual mask digital electron beam lithography},
author = {Baylor, Larry R and Thomas, Clarence E and Voelkl, Edgar and Moore, James A and Simpson, Michael L and Paulus, Michael J},
abstractNote = {Systems and methods for direct-to-digital holography are described. An apparatus includes a laser; a beamsplitter optically coupled to the laser; a reference beam mirror optically coupled to the beamsplitter; an object optically coupled to the beamsplitter, a focusing lens optically coupled to both the reference beam mirror and the object; and a digital recorder optically coupled to the focusing lens. A reference beam is incident upon the reference beam mirror at a non-normal angle, and the reference beam and an object beam are focused by the focusing lens at a focal plane of the digital recorder to form an image. The systems and methods provide advantages in that computer assisted holographic measurements can be made.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {1}
}
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