Process to form mesostructured films
Abstract
This invention comprises a method to form a family of supported films film with pore size in the approximate range 0.8-20 nm exhibiting highly ordered microstructures and porosity derived from an ordered micellar or liquid-crystalline organic-inorganic precursor structure that forms during film deposition. Optically transparent, 100-500-nm thick films exhibiting a unique range of microstructures and uni-modal pore sizes are formed in seconds in a continuous coating operation. Applications of these films include sensors, membranes, low dielectric constant interlayers, anti-reflective coatings, and optical hosts.
- Inventors:
-
- Albuquerque, NM
- Woodbury, MN
- Camarillo, CA
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 872097
- Patent Number(s):
- 5858457
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01D - SEPARATION
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- process; form; mesostructured; films; comprises; method; family; supported; film; pore; size; approximate; range; 8-20; nm; exhibiting; highly; microstructures; porosity; derived; micellar; liquid-crystalline; organic-inorganic; precursor; structure; forms; deposition; optically; transparent; 100-500-nm; thick; unique; uni-modal; sizes; formed; continuous; coating; operation; applications; sensors; membranes; dielectric; constant; interlayers; anti-reflective; coatings; optical; hosts; reflective coating; approximate range; reflective coatings; film deposition; thick film; optically transparent; dielectric constant; pore size; pore sizes; thick films; organic precursor; nm thick; anti-reflective coating; continuous coating; /427/
Citation Formats
Brinker, C Jeffrey, Anderson, Mark T, Ganguli, Rahul, and Lu, Yunfeng. Process to form mesostructured films. United States: N. p., 1999.
Web.
Brinker, C Jeffrey, Anderson, Mark T, Ganguli, Rahul, & Lu, Yunfeng. Process to form mesostructured films. United States.
Brinker, C Jeffrey, Anderson, Mark T, Ganguli, Rahul, and Lu, Yunfeng. Fri .
"Process to form mesostructured films". United States. https://www.osti.gov/servlets/purl/872097.
@article{osti_872097,
title = {Process to form mesostructured films},
author = {Brinker, C Jeffrey and Anderson, Mark T and Ganguli, Rahul and Lu, Yunfeng},
abstractNote = {This invention comprises a method to form a family of supported films film with pore size in the approximate range 0.8-20 nm exhibiting highly ordered microstructures and porosity derived from an ordered micellar or liquid-crystalline organic-inorganic precursor structure that forms during film deposition. Optically transparent, 100-500-nm thick films exhibiting a unique range of microstructures and uni-modal pore sizes are formed in seconds in a continuous coating operation. Applications of these films include sensors, membranes, low dielectric constant interlayers, anti-reflective coatings, and optical hosts.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {1}
}
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