Computer-aided engineering system for design of sequence arrays and lithographic masks

Hubbell, Earl A; Morris, MacDonald S; Winkler, James L

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A - human necessities
A01 - agriculture
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Title: Computer-aided engineering system for design of sequence arrays and lithographic masks

Abstract

An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system (100) is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files (104) to design and/or generate lithographic masks (110).

Inventors:

Hubbell, Earl A ^[1]; Morris, MacDonald S ^[2]; Winkler, James L ^[3]

Mt. View, CA
San Jose, CA
Palo Alto, CA

Issue Date:: 1999-01-05

Research Org.:: Affymetrix, Inc. (Santa Clara, CA)

OSTI Identifier:: 872076

Patent Number(s):: 5856101

Application Number:: 08/721,689

Assignee:: Affymetrix, Inc. (Santa Clara, CA)

Patent Classifications (CPCs):: B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY

B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES

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B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
B01J19/0046 - {Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides
B01J2219/00432 - Photolithographic masks
B01J2219/00529 - DNA chips
B01J2219/00585 - Parallel processes
B01J2219/0059 - Sequential processes
B01J2219/00596 - Solid-phase processes
B01J2219/00608 - DNA chips
B01J2219/00612 - the surface being inorganic
B01J2219/00626 - Covalent
B01J2219/00637 - by coating it with another layer
B01J2219/00659 - Two-dimensional arrays
B01J2219/00689 - using computers
B01J2219/00693 - Means for quality control
B01J2219/00695 - Synthesis control routines, e.g. using computer programs
B01J2219/00711 - Light-directed synthesis
B01J2219/00722 - Nucleotides

B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
B82Y30/00 - Nanotechnology for materials or surface science, e.g. nanocomposites

C - CHEMISTRY C07 - ORGANIC CHEMISTRY C07K - PEPTIDES
C07K1/04 - on carriers {
C07K1/045 - {using devices to improve synthesis, e.g. reactors, special vessels}

C - CHEMISTRY C40 - COMBINATORIAL TECHNOLOGY C40B - COMBINATORIAL CHEMISTRY
C40B40/06 - Libraries containing nucleotides or polynucleotides, or derivatives thereof
C40B60/14 - for creating libraries

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DOE Contract Number:: FG03-92ER81275

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: computer-aided; engineering; design; sequence; arrays; lithographic; masks; improved; set; computer; tools; forming; according; aspect; 100; select; probes; layout; array; dna; polymers; beneficial; characteristics; chip; files; 104; generate; 110; lithographic masks; sequence arrays; select probes; beneficial characteristics; computer tools; computer-aided engineering; chip design; generate lithographic; design files; improved set; forming arrays; lithographic mask; /435/

Citation Formats


                    Hubbell, Earl A, Morris, MacDonald S, and Winkler, James L. Computer-aided engineering system for design of sequence arrays and lithographic masks.  United States: N. p., 1999. 
        Web.

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                    Hubbell, Earl A, Morris, MacDonald S, & Winkler, James L. Computer-aided engineering system for design of sequence arrays and lithographic masks.  United States.

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                    Hubbell, Earl A, Morris, MacDonald S, and Winkler, James L. Tue .  
        "Computer-aided engineering system for design of sequence arrays and lithographic masks".  United States.  https://www.osti.gov/servlets/purl/872076.

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@article{osti_872076,

  title        = {Computer-aided engineering system for design of sequence arrays and lithographic masks},

  author       = {Hubbell, Earl A and Morris, MacDonald S and Winkler, James L},

  abstractNote = {An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system (100) is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files (104) to design and/or generate lithographic masks (110).},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1999},

  month        = {1}

}

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Works referenced in this record:

Light-directed, spatially addressable parallel chemical synthesis
journal, February 1991

Fodor, S.; Read, J.; Pirrung, M.
Science, Vol. 251, Issue 4995
https://doi.org/10.1126/science.1990438

Finding a manhattan path and related problems
journal, October 1983

Lipski, Witold
Networks, Vol. 13, Issue 3
https://doi.org/10.1002/net.3230130308

An algorithm for constructing regions with rectangles: Independence and minimum generating sets for collections of intervals
conference, January 1984

Franzblau, Deborah S.; Kleitman, Daniel J.
Proceedings of the sixteenth annual ACM symposium on Theory of computing - STOC '84
https://doi.org/10.1145/800057.808678

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Computer-aided engineering system for design of sequence arrays and lithographic masks

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An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks.
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An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system (100) is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files (104) to design and/or generate lithographic masks (110).
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An improved set of computer tools for forming arrays is disclosed. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks. 14 figs.
Computer-aided engineering system for design of sequence arrays and lithographic masks

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An improved set of computer tools for forming arrays is disclosed. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks. 14 figs.
Computer-aided engineering system for design of sequence arrays and lithographic masks

Patent Hubbell, E A; Morris, M S; Winkler, J L

An improved set of computer tools for forming arrays is disclosed. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks. 14 figs.

Similar Records

Title: Computer-aided engineering system for design of sequence arrays and lithographic masks

Abstract

Citation Formats

Light-directed, spatially addressable parallel chemical synthesis journal, February 1991

Finding a manhattan path and related problems journal, October 1983

An algorithm for constructing regions with rectangles: Independence and minimum generating sets for collections of intervals conference, January 1984

Light-directed, spatially addressable parallel chemical synthesis
journal, February 1991

Finding a manhattan path and related problems
journal, October 1983

An algorithm for constructing regions with rectangles: Independence and minimum generating sets for collections of intervals
conference, January 1984