Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication

Title: Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication

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Abstract

A miniature (dime-size in cross-section) vapor vacuum arc plasma gun is described for use in an apparatus to produce thin films. Any conductive material can be layered as a film on virtually any substrate. Because the entire apparatus can easily be contained in a small vacuum chamber, multiple dissimilar layers can be applied without risk of additional contamination. The invention has special applications in semiconductor manufacturing.

Inventors:

Brown, Ian G ^[1]; MacGill, Robert A ^[2]; Galvin, James E ^[3]; Ogletree, David F ^[4]; Salmeron, Miquel ^[4]

Berkeley, CA
Richmond, CA
Emmeryville, CA
El Cerrito, CA

Issue Date:: 1998-01-01

Research Org.:: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)

OSTI Identifier:: 871998

Patent Number(s):: 5841236

Assignee:: Regents of University of California (Oakland, CA)

Patent Classifications (CPCs):: C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE

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C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C14/325 - {Electric arc evaporation}

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
H05H1/48 - using an arc
H05H1/44 - using more than one torch

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DOE Contract Number:: AC03-76SF00098

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: miniature; pulsed; vacuum; plasma; gun; apparatus; thin-film; fabrication; dime-size; cross-section; vapor; described; produce; films; conductive; material; layered; film; virtually; substrate; entire; easily; contained; chamber; multiple; dissimilar; layers; applied; risk; additional; contamination; special; applications; semiconductor; manufacturing; vacuum chamber; conductive material; plasma gun; vapor vacuum; semiconductor manufacturing; special applications; special application; dissimilar layers; /315/204/

Citation Formats


                    Brown, Ian G, MacGill, Robert A, Galvin, James E, Ogletree, David F, and Salmeron, Miquel. Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication.  United States: N. p., 1998. 
        Web.

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                    Brown, Ian G, MacGill, Robert A, Galvin, James E, Ogletree, David F, & Salmeron, Miquel. Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication.  United States.

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                    Brown, Ian G, MacGill, Robert A, Galvin, James E, Ogletree, David F, and Salmeron, Miquel. Thu .  
        "Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication".  United States.  https://www.osti.gov/servlets/purl/871998.

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@article{osti_871998,

  title        = {Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication},

  author       = {Brown, Ian G and MacGill, Robert A and Galvin, James E and Ogletree, David F and Salmeron, Miquel},

  abstractNote = {A miniature (dime-size in cross-section) vapor vacuum arc plasma gun is described for use in an apparatus to produce thin films. Any conductive material can be layered as a film on virtually any substrate. Because the entire apparatus can easily be contained in a small vacuum chamber, multiple dissimilar layers can be applied without risk of additional contamination. The invention has special applications in semiconductor manufacturing.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1998},

  month        = {1}

}

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