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Title: Surface treatment of magnetic recording heads

Abstract

Surface modification of magnetic recording heads using plasma immersion ion implantation and deposition is disclosed. This method may be carried out using a vacuum arc deposition system with a metallic or carbon cathode. By operating a plasma gun in a long-pulse mode and biasing the substrate holder with short pulses of a high negative voltage, direct ion implantation, recoil implantation, and surface deposition are combined to modify the near-surface regions of the head or substrate in processing times which may be less than 5 min. The modified regions are atomically mixed into the substrate. This surface modification improves the surface smoothness and hardness and enhances the tribological characteristics under conditions of contact-start-stop and continuous sliding. These results are obtained while maintaining original tolerances.

Inventors:
 [1];  [2];  [3];  [3];  [3];  [4]
  1. Orinda, CA
  2. Berkeley, CA
  3. Albany, CA
  4. Morgan Hill, CA
Issue Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
OSTI Identifier:
871982
Patent Number(s):
5838522
Assignee:
Regents of University of California (Oakland, CA)
Patent Classifications (CPCs):
C - CHEMISTRY C04 - CEMENTS C04B - LIME, MAGNESIA
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
surface; treatment; magnetic; recording; heads; modification; plasma; immersion; implantation; deposition; disclosed; method; carried; vacuum; metallic; carbon; cathode; operating; gun; long-pulse; mode; biasing; substrate; holder; pulses; negative; voltage; direct; recoil; combined; modify; near-surface; regions; head; processing; times; modified; atomically; mixed; improves; smoothness; hardness; enhances; tribological; characteristics; conditions; contact-start-stop; continuous; sliding; results; obtained; maintaining; original; tolerances; negative voltage; processing time; substrate holder; surface modification; surface region; magnetic recording; plasma gun; near-surface regions; surface treatment; surface smoothness; surface deposition; surface deposit; near-surface region; recording heads; pulse mode; surface regions; plasma immersion; /360/

Citation Formats

Komvopoulos, Kyriakos, Brown, Ian G, Wei, Bo, Anders, Simone, Anders, Andre, and Bhatia, C Singh. Surface treatment of magnetic recording heads. United States: N. p., 1998. Web.
Komvopoulos, Kyriakos, Brown, Ian G, Wei, Bo, Anders, Simone, Anders, Andre, & Bhatia, C Singh. Surface treatment of magnetic recording heads. United States.
Komvopoulos, Kyriakos, Brown, Ian G, Wei, Bo, Anders, Simone, Anders, Andre, and Bhatia, C Singh. Thu . "Surface treatment of magnetic recording heads". United States. https://www.osti.gov/servlets/purl/871982.
@article{osti_871982,
title = {Surface treatment of magnetic recording heads},
author = {Komvopoulos, Kyriakos and Brown, Ian G and Wei, Bo and Anders, Simone and Anders, Andre and Bhatia, C Singh},
abstractNote = {Surface modification of magnetic recording heads using plasma immersion ion implantation and deposition is disclosed. This method may be carried out using a vacuum arc deposition system with a metallic or carbon cathode. By operating a plasma gun in a long-pulse mode and biasing the substrate holder with short pulses of a high negative voltage, direct ion implantation, recoil implantation, and surface deposition are combined to modify the near-surface regions of the head or substrate in processing times which may be less than 5 min. The modified regions are atomically mixed into the substrate. This surface modification improves the surface smoothness and hardness and enhances the tribological characteristics under conditions of contact-start-stop and continuous sliding. These results are obtained while maintaining original tolerances.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1998},
month = {1}
}

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Works referenced in this record:

Plasma synthesis of metallic and composite thin films with atomically mixed substrate bonding
journal, January 1993


Macroparticle‐free thin films produced by an efficient vacuum arc deposition technique
journal, September 1993


Novel metal ion surface modification technique
journal, April 1991


Joining of Metal Films to Carbon-Carbon Composite Material by Metal Plasma Immersion Ion Implantation
journal, January 1993


Low Energy Ion Implantation / Deposition as a Film Synthesis and Bonding Tool
journal, January 1993