Low temperature formation of electrode having electrically conductive metal oxide surface
Abstract
A low temperature process is disclosed for forming metal suboxides on substrates by cathodic arc deposition by either controlling the pressure of the oxygen present in the deposition chamber, or by controlling the density of the metal flux, or by a combination of such adjustments, to thereby control the ratio of oxide to metal in the deposited metal suboxide coating. The density of the metal flux may, in turn, be adjusted by controlling the discharge current of the arc, by adjusting the pulse length (duration of on cycle) of the arc, and by adjusting the frequency of the arc, or any combination of these parameters. In a preferred embodiment, a low temperature process is disclosed for forming an electrically conductive metal suboxide, such as, for example, an electrically conductive suboxide of titanium, on an electrode surface, such as the surface of a nickel oxide electrode, by such cathodic arc deposition and control of the deposition parameters. In the preferred embodiment, the process results in a titanium suboxide-coated nickel oxide electrode exhibiting reduced parasitic evolution of oxygen during charging of a cell made using such an electrode as the positive electrode, as well as exhibiting high oxygen overpotential, resulting in suppressionmore »
- Inventors:
-
- Albany, CA
- Berkeley, CA
- Orinda, CA
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- OSTI Identifier:
- 871933
- Patent Number(s):
- 5827580
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01M - PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- temperature; formation; electrode; electrically; conductive; metal; oxide; surface; process; disclosed; forming; suboxides; substrates; cathodic; deposition; controlling; pressure; oxygen; chamber; density; flux; combination; adjustments; control; ratio; deposited; suboxide; coating; adjusted; discharge; current; adjusting; pulse; length; duration; cycle; frequency; parameters; preferred; embodiment; example; titanium; nickel; results; suboxide-coated; exhibiting; reduced; parasitic; evolution; charging; cell; positive; overpotential; resulting; suppression; charge; oxide electrode; forming metal; process results; deposition parameters; discharge current; pulse length; oxide surface; oxide coating; deposition chamber; positive electrode; metal oxide; electrically conductive; preferred embodiment; nickel oxide; electrode surface; conductive metal; temperature process; temperature formation; oxygen evolution; charge current; exhibiting reduced; /427/
Citation Formats
Anders, Simone, Anders, Andre, Brown, Ian G, McLarnon, Frank R, and Kong, Fanping. Low temperature formation of electrode having electrically conductive metal oxide surface. United States: N. p., 1998.
Web.
Anders, Simone, Anders, Andre, Brown, Ian G, McLarnon, Frank R, & Kong, Fanping. Low temperature formation of electrode having electrically conductive metal oxide surface. United States.
Anders, Simone, Anders, Andre, Brown, Ian G, McLarnon, Frank R, and Kong, Fanping. Thu .
"Low temperature formation of electrode having electrically conductive metal oxide surface". United States. https://www.osti.gov/servlets/purl/871933.
@article{osti_871933,
title = {Low temperature formation of electrode having electrically conductive metal oxide surface},
author = {Anders, Simone and Anders, Andre and Brown, Ian G and McLarnon, Frank R and Kong, Fanping},
abstractNote = {A low temperature process is disclosed for forming metal suboxides on substrates by cathodic arc deposition by either controlling the pressure of the oxygen present in the deposition chamber, or by controlling the density of the metal flux, or by a combination of such adjustments, to thereby control the ratio of oxide to metal in the deposited metal suboxide coating. The density of the metal flux may, in turn, be adjusted by controlling the discharge current of the arc, by adjusting the pulse length (duration of on cycle) of the arc, and by adjusting the frequency of the arc, or any combination of these parameters. In a preferred embodiment, a low temperature process is disclosed for forming an electrically conductive metal suboxide, such as, for example, an electrically conductive suboxide of titanium, on an electrode surface, such as the surface of a nickel oxide electrode, by such cathodic arc deposition and control of the deposition parameters. In the preferred embodiment, the process results in a titanium suboxide-coated nickel oxide electrode exhibiting reduced parasitic evolution of oxygen during charging of a cell made using such an electrode as the positive electrode, as well as exhibiting high oxygen overpotential, resulting in suppression of oxygen evolution at the electrode at full charge of the cell.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Jan 01 00:00:00 EST 1998},
month = {Thu Jan 01 00:00:00 EST 1998}
}
Works referenced in this record:
Cathodic arc deposition of copper oxide thin films
journal, January 1996
- MacGill, R. A.; Anders, S.; Anders, A.
- Surface and Coatings Technology, Vol. 78, Issue 1-3
Formation of metal oxides by cathodic arc deposition
journal, November 1995
- Anders, S.; Anders, A.; Rubin, M.
- Surface and Coatings Technology, Vol. 76-77