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Title: Ringfield lithographic camera

Abstract

A projection lithography camera is presented with a wide ringfield optimized so as to make efficient use of extreme ultraviolet radiation from a large area radiation source (e.g., D.sub.source .apprxeq.0.5 mm). The camera comprises four aspheric mirrors optically arranged on a common axis of symmetry with an increased etendue for the camera system. The camera includes an aperture stop that is accessible through a plurality of partial aperture stops to synthesize the theoretical aperture stop. Radiation from a mask is focused to form a reduced image on a wafer, relative to the mask, by reflection from the four aspheric mirrors.

Inventors:
 [1]
  1. (Albuquerque, NM)
Issue Date:
Research Org.:
SANDIA CORP
OSTI Identifier:
871832
Patent Number(s):
5805365
Assignee:
Sandia Corporation (Albuquerque, NM) SNL
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
ringfield; lithographic; camera; projection; lithography; wide; optimized; efficient; extreme; ultraviolet; radiation; source; apprxeq; comprises; aspheric; mirrors; optically; arranged; common; axis; symmetry; increased; etendue; aperture; stop; accessible; plurality; partial; stops; synthesize; theoretical; mask; focused; form; reduced; image; wafer; relative; reflection; projection lithography; ultraviolet radiation; extreme ultraviolet; radiation source; common axis; camera comprises; lithographic camera; aspheric mirrors; aspheric mirror; lithography camera; /359/378/

Citation Formats

Sweatt, William C. Ringfield lithographic camera. United States: N. p., 1998. Web.
Sweatt, William C. Ringfield lithographic camera. United States.
Sweatt, William C. Thu . "Ringfield lithographic camera". United States. https://www.osti.gov/servlets/purl/871832.
@article{osti_871832,
title = {Ringfield lithographic camera},
author = {Sweatt, William C.},
abstractNote = {A projection lithography camera is presented with a wide ringfield optimized so as to make efficient use of extreme ultraviolet radiation from a large area radiation source (e.g., D.sub.source .apprxeq.0.5 mm). The camera comprises four aspheric mirrors optically arranged on a common axis of symmetry with an increased etendue for the camera system. The camera includes an aperture stop that is accessible through a plurality of partial aperture stops to synthesize the theoretical aperture stop. Radiation from a mask is focused to form a reduced image on a wafer, relative to the mask, by reflection from the four aspheric mirrors.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1998},
month = {1}
}

Patent:

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