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Title: Chemical vapor deposition of mullite coatings

Abstract

This invention is directed to the creation of crystalline mullite coatings having uniform microstructure by chemical vapor deposition (CVD). The process comprises the steps of establishing a flow of reactants which will yield mullite in a CVD reactor, and depositing a crystalline coating from the reactant flow. The process will yield crystalline coatings which are dense and of uniform thickness.

Inventors:
 [1];  [2]
  1. (Lexington, MA)
  2. (Boston, MA)
Issue Date:
Research Org.:
LOCKHEED MARTIN ENRGY SYST INC
OSTI Identifier:
871606
Patent Number(s):
5763008
Assignee:
Trustees of Boston University (Boston, MA) ORNL
DOE Contract Number:  
AC05-84OR21400
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
chemical; vapor; deposition; mullite; coatings; directed; creation; crystalline; uniform; microstructure; cvd; process; comprises; steps; establishing; flow; reactants; yield; reactor; depositing; coating; reactant; dense; thickness; uniform thickness; chemical vapor; vapor deposition; process comprises; reactant flow; mullite coatings; form microstructure; /427/

Citation Formats

Sarin, Vinod, and Mulpuri, Rao. Chemical vapor deposition of mullite coatings. United States: N. p., 1998. Web.
Sarin, Vinod, & Mulpuri, Rao. Chemical vapor deposition of mullite coatings. United States.
Sarin, Vinod, and Mulpuri, Rao. Thu . "Chemical vapor deposition of mullite coatings". United States. https://www.osti.gov/servlets/purl/871606.
@article{osti_871606,
title = {Chemical vapor deposition of mullite coatings},
author = {Sarin, Vinod and Mulpuri, Rao},
abstractNote = {This invention is directed to the creation of crystalline mullite coatings having uniform microstructure by chemical vapor deposition (CVD). The process comprises the steps of establishing a flow of reactants which will yield mullite in a CVD reactor, and depositing a crystalline coating from the reactant flow. The process will yield crystalline coatings which are dense and of uniform thickness.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1998},
month = {1}
}

Patent:

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