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Title: Secondary electron ion source neutron generator

Abstract

A neutron generator employing an electron emitter, an ion source bombarded by the electrons from the electron emitter, a plasma containment zone, and a target situated between the plasma containment zone and the electron emitter. The target contains occluded deuterium, tritium, or a mixture thereof

Inventors:
 [1];  [1]
  1. (Albuquerque, NM)
Issue Date:
Research Org.:
Sandia National Laboratories (SNL-NM), Albuquerque, NM; American Telephone and Telegraph Company
Sponsoring Org.:
USDOE
OSTI Identifier:
871515
Patent Number(s):
5745536
Assignee:
Sandia Corporation (Albuquerque, NM) SNL
DOE Contract Number:  
AC04-76DP00789; AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
secondary; electron; source; neutron; generator; employing; emitter; bombarded; electrons; plasma; containment; zone; target; situated; contains; occluded; deuterium; tritium; mixture; electron emitter; plasma containment; neutron generator; secondary electron; containment zone; /376/

Citation Formats

Brainard, John P., and McCollister, Daryl R. Secondary electron ion source neutron generator. United States: N. p., 1998. Web.
Brainard, John P., & McCollister, Daryl R. Secondary electron ion source neutron generator. United States.
Brainard, John P., and McCollister, Daryl R. Thu . "Secondary electron ion source neutron generator". United States. https://www.osti.gov/servlets/purl/871515.
@article{osti_871515,
title = {Secondary electron ion source neutron generator},
author = {Brainard, John P. and McCollister, Daryl R.},
abstractNote = {A neutron generator employing an electron emitter, an ion source bombarded by the electrons from the electron emitter, a plasma containment zone, and a target situated between the plasma containment zone and the electron emitter. The target contains occluded deuterium, tritium, or a mixture thereof},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1998},
month = {1}
}

Patent:

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