DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Semiconductor structures having electrically insulating and conducting portions formed from an AlSb-alloy layer

Abstract

A semiconductor structure. The semiconductor structure comprises a plurality of semiconductor layers formed on a substrate including at least one layer of a III-V compound semiconductor alloy comprising aluminum (Al) and antimony (Sb), with at least a part of the AlSb-alloy layer being chemically converted by an oxidation process to form superposed electrically insulating and electrically conducting portions. The electrically insulating portion formed from the AlSb-alloy layer comprises an oxide of aluminum (e.g. Al.sub.2 O.sub.3), while the electrically conducting portion comprises Sb. A lateral oxidation process allows formation of the superposed insulating and conducting portions below monocrystalline semiconductor layers for forming many different types of semiconductor structures having particular utility for optoelectronic devices such as light-emitting diodes, edge-emitting lasers, vertical-cavity surface-emitting lasers, photodetectors and optical modulators (waveguide and surface normal), and for electronic devices such as heterojunction bipolar transistors, field-effect transistors and quantum-effect devices. The invention is expected to be particularly useful for forming light-emitting devices for use in the 1.3-1.6 .mu.m wavelength range, with the AlSb-alloy layer acting to define an active region of the device and to effectively channel an electrical current therein for efficient light generation.

Inventors:
 [1];  [1]
  1. Albuquerque, NM
Issue Date:
Research Org.:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
OSTI Identifier:
871414
Patent Number(s):
5726462
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01S - DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
semiconductor; structures; electrically; insulating; conducting; portions; formed; alsb-alloy; layer; structure; comprises; plurality; layers; substrate; including; iii-v; compound; alloy; comprising; aluminum; antimony; sb; chemically; converted; oxidation; process; form; superposed; portion; oxide; lateral; allows; formation; below; monocrystalline; forming; types; particular; utility; optoelectronic; devices; light-emitting; diodes; edge-emitting; lasers; vertical-cavity; surface-emitting; photodetectors; optical; modulators; waveguide; surface; normal; electronic; heterojunction; bipolar; transistors; field-effect; quantum-effect; expected; particularly; useful; 3-1; wavelength; range; acting; define; active; region; device; effectively; channel; electrical; current; therein; efficient; light; generation; cavity surface; surface-emitting laser; emitting diodes; emitting diode; light-emitting diode; field-effect transistor; iii-v compound; wavelength range; vertical-cavity surface-emitting; layer comprises; alloy comprising; active region; electrically insulating; particularly useful; semiconductor layer; electrically conducting; electrical current; compound semiconductor; electronic devices; surface-emitting lasers; alloy layer; process allows; crystalline semiconductor; conducting portion; oxidation process; semiconductor alloy; light-emitting diodes; semiconductor layers; structure comprises; particular utility; effect transistor; layers formed; portion formed; semiconductor structure; optical modulator; emitting laser; emitting device; surface normal; substrate including; field-effect transistors; electronic device; conducting portions; bipolar transistors; bipolar transistor; light-emitting device; comprising aluminum; effect transistors; edge-emitting lasers; heterojunction bipolar; insulating portion; emitting lasers; optoelectronic device; portions formed; /257/

Citation Formats

Spahn, Olga B, and Lear, Kevin L. Semiconductor structures having electrically insulating and conducting portions formed from an AlSb-alloy layer. United States: N. p., 1998. Web.
Spahn, Olga B, & Lear, Kevin L. Semiconductor structures having electrically insulating and conducting portions formed from an AlSb-alloy layer. United States.
Spahn, Olga B, and Lear, Kevin L. Tue . "Semiconductor structures having electrically insulating and conducting portions formed from an AlSb-alloy layer". United States. https://www.osti.gov/servlets/purl/871414.
@article{osti_871414,
title = {Semiconductor structures having electrically insulating and conducting portions formed from an AlSb-alloy layer},
author = {Spahn, Olga B and Lear, Kevin L},
abstractNote = {A semiconductor structure. The semiconductor structure comprises a plurality of semiconductor layers formed on a substrate including at least one layer of a III-V compound semiconductor alloy comprising aluminum (Al) and antimony (Sb), with at least a part of the AlSb-alloy layer being chemically converted by an oxidation process to form superposed electrically insulating and electrically conducting portions. The electrically insulating portion formed from the AlSb-alloy layer comprises an oxide of aluminum (e.g. Al.sub.2 O.sub.3), while the electrically conducting portion comprises Sb. A lateral oxidation process allows formation of the superposed insulating and conducting portions below monocrystalline semiconductor layers for forming many different types of semiconductor structures having particular utility for optoelectronic devices such as light-emitting diodes, edge-emitting lasers, vertical-cavity surface-emitting lasers, photodetectors and optical modulators (waveguide and surface normal), and for electronic devices such as heterojunction bipolar transistors, field-effect transistors and quantum-effect devices. The invention is expected to be particularly useful for forming light-emitting devices for use in the 1.3-1.6 .mu.m wavelength range, with the AlSb-alloy layer acting to define an active region of the device and to effectively channel an electrical current therein for efficient light generation.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1998},
month = {3}
}

Works referenced in this record:

Oxide‐Substrate and Oxide‐Oxide Chemical Reactions in Thermally Annealed Anodic Films on GaSb , GaAs , and GaP
journal, November 1980


Native‐oxide stripe‐geometry In 0.5 (Al x Ga 1− x ) 0.5 P‐In 0.5 Ga 0.5 P heterostructure laser diodes
journal, July 1991


Oxide layers on III–V compound semiconductors
journal, December 1976


Quantitative Auger analysis by depth profiling of line shapes: Application to native oxide-InSb interfaces
journal, July 1985


Planar native‐oxide Al x Ga 1− x As‐GaAs quantum well heterostructure ring laser diodes
journal, March 1992


Fabrication and performance of selectively oxidized vertical-cavity lasers
journal, November 1995


Selectively oxidised vertical cavity surface emitting lasers with 50% power conversion efficiency
journal, February 1995


Native‐oxide defined ring contact for low threshold vertical‐cavity lasers
journal, July 1994


Analyse de l'interface oxyde-semiconducteur de AlSb par spectrométrie Auger et diffusion raman
journal, January 1981


Detection of excess crystalline As and Sb in III‐V oxide interfaces by Raman scattering
journal, December 1977


Long wavelength (λ∼1.5 μm) native‐oxide‐defined InAlAs‐InP‐InGaAsP quantum well heterostructure laser diodes
journal, March 1994


A Rutherford Backscattering Spectroscopic Study of the Aluminum Antimonide Oxidation Process in Air
journal, April 1994


Electrical characterization of thermally grown native oxide on gallium antimonide
journal, July 1991


Light Scattering on Residual Sb Layers Formed After Surface Oxidization of Ga1−xAlxSb
journal, April 1980


Room-temperature continuous-wave operation of 1.54-μm vertical-cavity lasers
journal, November 1995


Planar native‐oxide index‐guided Al x Ga 1− x As‐GaAs quantum well heterostructure lasers
journal, September 1991