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Title: Preparation of a semiconductor thin film

Abstract

A process for the preparation of a semiconductor film. The process comprises depositing nanoparticles of a semiconductor material onto a substrate whose surface temperature during nanoparticle deposition thereon is sufficient to cause substantially simultaneous fusion of the nanoparticles to thereby coalesce with each other and effectuate film growth.

Inventors:
 [1];  [2];  [3];  [4]
  1. TuBingen, DE
  2. Denver, CO
  3. Lakewood, CO
  4. Evergreen, CO
Issue Date:
Research Org.:
Midwest Research Institute, Kansas City, MO (United States)
OSTI Identifier:
871342
Patent Number(s):
5711803
Assignee:
Midwest Research Institute (Kansas City, MO)
Patent Classifications (CPCs):
C - CHEMISTRY C01 - INORGANIC CHEMISTRY C01P - INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
DOE Contract Number:  
AC36-83CH10093
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
preparation; semiconductor; film; process; comprises; depositing; nanoparticles; material; substrate; surface; temperature; nanoparticle; deposition; thereon; sufficient; substantially; simultaneous; fusion; coalesce; effectuate; growth; semiconductor film; film growth; particle deposition; semiconductor material; process comprises; comprises depositing; surface temperature; deposition thereon; substantially simultaneous; /117/

Citation Formats

Pehnt, Martin, Schulz, Douglas L, Curtis, Calvin J, and Ginley, David S. Preparation of a semiconductor thin film. United States: N. p., 1998. Web.
Pehnt, Martin, Schulz, Douglas L, Curtis, Calvin J, & Ginley, David S. Preparation of a semiconductor thin film. United States.
Pehnt, Martin, Schulz, Douglas L, Curtis, Calvin J, and Ginley, David S. Thu . "Preparation of a semiconductor thin film". United States. https://www.osti.gov/servlets/purl/871342.
@article{osti_871342,
title = {Preparation of a semiconductor thin film},
author = {Pehnt, Martin and Schulz, Douglas L and Curtis, Calvin J and Ginley, David S},
abstractNote = {A process for the preparation of a semiconductor film. The process comprises depositing nanoparticles of a semiconductor material onto a substrate whose surface temperature during nanoparticle deposition thereon is sufficient to cause substantially simultaneous fusion of the nanoparticles to thereby coalesce with each other and effectuate film growth.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1998},
month = {1}
}

Patent:

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