Precision cleaning apparatus and method
Abstract
A precision cleaning apparatus and method. The precision cleaning apparatus includes a cleaning monitor further comprising an acoustic wave cleaning sensor such as a quartz crystal microbalance (QCM), a flexural plate wave (FPW) sensor, a shear horizontal acoustic plate mode (SH--APM) sensor, or a shear horizontal surface acoustic wave (SH--SAW) sensor; and measurement means connectable to the sensor for measuring in-situ one or more electrical response characteristics that vary in response to removal of one or more contaminants from the sensor and a workpiece located adjacent to the sensor during cleaning. Methods are disclosed for precision cleaning of one or more contaminants from a surface of the workpiece by means of the cleaning monitor that determines a state of cleanliness and any residual contamination that may be present after cleaning; and also for determining an effectiveness of a cleaning medium for removing one or more contaminants from a workpiece.
- Inventors:
-
- Albuquerque, NM
- Cedar Crest, NM
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 871319
- Patent Number(s):
- 5706840
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B08 - CLEANING B08B - CLEANING IN GENERAL
G - PHYSICS G01 - MEASURING G01G - WEIGHING
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- precision; cleaning; apparatus; method; monitor; comprising; acoustic; wave; sensor; quartz; crystal; microbalance; qcm; flexural; plate; fpw; shear; horizontal; mode; sh-apm; surface; sh-saw; measurement; means; connectable; measuring; in-situ; electrical; response; characteristics; vary; removal; contaminants; workpiece; located; adjacent; methods; disclosed; determines; cleanliness; residual; contamination; determining; effectiveness; medium; removing; acoustic plate; flexural plate; plate wave; surface acoustic; acoustic wave; located adjacent; quartz crystal; cleaning apparatus; crystal microbalance; horizontal surface; plate mode; precision cleaning; response characteristic; electrical response; /134/
Citation Formats
Schneider, Thomas W, Frye, Gregory C, and Martin, Stephen J. Precision cleaning apparatus and method. United States: N. p., 1998.
Web.
Schneider, Thomas W, Frye, Gregory C, & Martin, Stephen J. Precision cleaning apparatus and method. United States.
Schneider, Thomas W, Frye, Gregory C, and Martin, Stephen J. Tue .
"Precision cleaning apparatus and method". United States. https://www.osti.gov/servlets/purl/871319.
@article{osti_871319,
title = {Precision cleaning apparatus and method},
author = {Schneider, Thomas W and Frye, Gregory C and Martin, Stephen J},
abstractNote = {A precision cleaning apparatus and method. The precision cleaning apparatus includes a cleaning monitor further comprising an acoustic wave cleaning sensor such as a quartz crystal microbalance (QCM), a flexural plate wave (FPW) sensor, a shear horizontal acoustic plate mode (SH--APM) sensor, or a shear horizontal surface acoustic wave (SH--SAW) sensor; and measurement means connectable to the sensor for measuring in-situ one or more electrical response characteristics that vary in response to removal of one or more contaminants from the sensor and a workpiece located adjacent to the sensor during cleaning. Methods are disclosed for precision cleaning of one or more contaminants from a surface of the workpiece by means of the cleaning monitor that determines a state of cleanliness and any residual contamination that may be present after cleaning; and also for determining an effectiveness of a cleaning medium for removing one or more contaminants from a workpiece.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1998},
month = {1}
}
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Works referenced in this record:
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journal, December 1993
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Effect of surface roughness on the response of thickness-shear mode resonators in liquids
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Characterization of a thicknessâshear mode quartz resonator with multiple nonpiezoelectric layers
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Applications of the quartz crystal microbalance to electrochemistry. Measurement of ion and solvent populations in thin films of poly(vinylferrocene) as functions of redox state
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Cleaning up our act: Alternatives for hazardous solvents used in cleaning
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Characterization of a quartz crystal microbalance with simultaneous mass and liquid loading
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