Precision cleaning apparatus and method

Title: Precision cleaning apparatus and method

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Abstract

A precision cleaning apparatus and method. The precision cleaning apparatus includes a cleaning monitor further comprising an acoustic wave cleaning sensor such as a quartz crystal microbalance (QCM), a flexural plate wave (FPW) sensor, a shear horizontal acoustic plate mode (SH--APM) sensor, or a shear horizontal surface acoustic wave (SH--SAW) sensor; and measurement means connectable to the sensor for measuring in-situ one or more electrical response characteristics that vary in response to removal of one or more contaminants from the sensor and a workpiece located adjacent to the sensor during cleaning. Methods are disclosed for precision cleaning of one or more contaminants from a surface of the workpiece by means of the cleaning monitor that determines a state of cleanliness and any residual contamination that may be present after cleaning; and also for determining an effectiveness of a cleaning medium for removing one or more contaminants from a workpiece.

Inventors:

Schneider, Thomas W ^[1]; Frye, Gregory C ^[2]; Martin, Stephen J ^[1]

Albuquerque, NM
Cedar Crest, NM

Issue Date:: 1998-01-01

Research Org.:: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)

OSTI Identifier:: 871319

Patent Number(s):: 5706840

Assignee:: Sandia Corporation (Albuquerque, NM)

Patent Classifications (CPCs):: B - PERFORMING OPERATIONS B08 - CLEANING B08B - CLEANING IN GENERAL

G - PHYSICS G01 - MEASURING G01G - WEIGHING

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B - PERFORMING OPERATIONS B08 - CLEANING B08B - CLEANING IN GENERAL
B08B3/00 - Cleaning by methods involving the use or presence of liquid or steam

G - PHYSICS G01 - MEASURING G01G - WEIGHING
G01G3/13 - having piezo-electric or piezo-resistive properties

G - PHYSICS G01 - MEASURING G01H - MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC OR INFRASONIC WAVES
G01H13/00 - Measuring resonant frequency

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DOE Contract Number:: AC04-94AL85000

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: precision; cleaning; apparatus; method; monitor; comprising; acoustic; wave; sensor; quartz; crystal; microbalance; qcm; flexural; plate; fpw; shear; horizontal; mode; sh-apm; surface; sh-saw; measurement; means; connectable; measuring; in-situ; electrical; response; characteristics; vary; removal; contaminants; workpiece; located; adjacent; methods; disclosed; determines; cleanliness; residual; contamination; determining; effectiveness; medium; removing; acoustic plate; flexural plate; plate wave; surface acoustic; acoustic wave; located adjacent; quartz crystal; cleaning apparatus; crystal microbalance; horizontal surface; plate mode; precision cleaning; response characteristic; electrical response; /134/

Citation Formats


                    Schneider, Thomas W, Frye, Gregory C, and Martin, Stephen J. Precision cleaning apparatus and method.  United States: N. p., 1998. 
        Web.

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                    Schneider, Thomas W, Frye, Gregory C, & Martin, Stephen J. Precision cleaning apparatus and method.  United States.

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                    Schneider, Thomas W, Frye, Gregory C, and Martin, Stephen J. Thu .  
        "Precision cleaning apparatus and method".  United States.  https://www.osti.gov/servlets/purl/871319.

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@article{osti_871319,

  title        = {Precision cleaning apparatus and method},

  author       = {Schneider, Thomas W and Frye, Gregory C and Martin, Stephen J},

  abstractNote = {A precision cleaning apparatus and method. The precision cleaning apparatus includes a cleaning monitor further comprising an acoustic wave cleaning sensor such as a quartz crystal microbalance (QCM), a flexural plate wave (FPW) sensor, a shear horizontal acoustic plate mode (SH--APM) sensor, or a shear horizontal surface acoustic wave (SH--SAW) sensor; and measurement means connectable to the sensor for measuring in-situ one or more electrical response characteristics that vary in response to removal of one or more contaminants from the sensor and a workpiece located adjacent to the sensor during cleaning. Methods are disclosed for precision cleaning of one or more contaminants from a surface of the workpiece by means of the cleaning monitor that determines a state of cleanliness and any residual contamination that may be present after cleaning; and also for determining an effectiveness of a cleaning medium for removing one or more contaminants from a workpiece.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1998},

  month        = {1}

}

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