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Title: Process for growing a film epitaxially upon a MgO surface

A process and structure wherein optical quality perovskites, such as BaTiO.sub.3 or SrTiO.sub.3, are grown upon a single crystal MgO substrate involves the epitaxial build up of alternating planes of TiO.sub.2 and metal oxide wherein the first plane grown upon the MgO substrate is a plane of TiO.sub.2. The layering sequence involved in the film build up reduces problems which would otherwise result from the interfacial electrostatics at the first atomic layers, and these oxides can be stabilized as commensurate thin films at a unit cell thickness or grown with high crystal quality to thicknesses of 0.5-0.7 .mu.m for optical device applications.
Inventors:
 [1];  [2]
  1. (Kingston, TN)
  2. (Oak Ridge, TN)
Issue Date:
OSTI Identifier:
871254
Assignee:
Lockheed Martin Energy Systems, Inc. (Oak Ridge, TN) ORNL
Patent Number(s):
US 5693140
Research Org:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN
Country of Publication:
United States
Language:
English
Subject:
process; growing; film; epitaxially; mgo; surface; structure; optical; quality; perovskites; batio; srtio; grown; single; crystal; substrate; involves; epitaxial; build; alternating; planes; metal; oxide; plane; layering; sequence; involved; reduces; otherwise; result; interfacial; electrostatics; atomic; layers; oxides; stabilized; commensurate; films; unit; cell; thickness; thicknesses; 5-0; device; applications; atomic layers; cell thickness; sequence involved; crystal quality; layering sequence; device applications; metal oxide; single crystal; optical device; otherwise result; unit cell; optical quality; mgo substrate; epitaxial build; interfacial electrostatics; film build; film epitaxially; quality perovskites; mgo surface; substrate involves; alternating planes; crystal mgo; /117/427/