Title: Maskless, reticle-free, lithography

Abstract

A lithography system in which the mask or reticle, which usually carries the pattern to be printed onto a substrate, is replaced by a programmable array of binary (i.e. on/off) light valves or switches which can be programmed to replicate a portion of the pattern each time an illuminating light source is flashed. The pattern of light produced by the programmable array is imaged onto a lithographic substrate which is mounted on a scanning stage as is common in optical lithography. The stage motion and the pattern of light displayed by the programmable array are precisely synchronized with the flashing illumination system so that each flash accurately positions the image of the pattern on the substrate. This is achieved by advancing the pattern held in the programmable array by an amount which corresponds to the travel of the substrate stage each time the light source flashes. In this manner the image is built up of multiple flashes and an isolated defect in the array will only have a small effect on the printed pattern. The method includes projection lithographies using radiation other than optical or ultraviolet light. The programmable array of binary switches would be used to control extreme ultravioletmore » (EUV), x-ray, or electron, illumination systems, obviating the need for stable, defect free masks for projection EUV, x-ray, or electron, lithographies. « less

Inventors:

Ceglio, Natale M ^[1]; Markle, David A ^[2]

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1. Livermore, CA
2. Saratoga, CA

Issue Date:

1997-11-25

Research Org.:

Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

OSTI Identifier:

871251

Patent Number(s):

5691541

Application Number:

08/645531

Assignee:

Regents of University of California (Oakland, CA); Ultratech Stepper, Inc. (San Jose, CA)

Patent Classifications (CPCs):

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

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G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

G03F7/70041 - {by pulsed sources}
G03F7/70283 - {Masks or their effects on the imaging process, e.g. Fourier masks, greyscale masks, holographic masks, phase shift masks, phasemasks, lenticular masks, multiple masks, tilted masks, tandem masks
G03F7/70291 - {Addressable masks}
G03F7/70475 - {Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display}
G03F7/70725 - {control}
G03F7/70791 - {Large workpieces, e.g. in the shape of web or polygon}

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DOE Contract Number:  

W-7405-ENG-48

Resource Type:

Patent

Country of Publication:

United States

Language:

English

Subject:

maskless; reticle-free; lithography; mask; reticle; carries; pattern; printed; substrate; replaced; programmable; array; binary; light; valves; switches; programmed; replicate; portion; time; illuminating; source; flashed; produced; imaged; lithographic; mounted; scanning; stage; common; optical; motion; displayed; precisely; synchronized; flashing; illumination; flash; accurately; positions; image; achieved; advancing; held; amount; corresponds; travel; flashes; manner; built; multiple; isolated; defect; effect; method; projection; lithographies; radiation; ultraviolet; control; extreme; euv; x-ray; electron; systems; obviating; stable; free; masks; programmable array; defect free; light produced; ultraviolet light; light source; extreme ultraviolet; illuminating light; illumination systems; accurately position; violet light; accurately positions; light valves; light valve; /250/355/378/