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Title: Monocrystalline test structures, and use for calibrating instruments

An improved test structure for measurement of width of conductive lines formed on substrates as performed in semiconductor fabrication, and for calibrating instruments for such measurements, is formed from a monocrystalline starting material, having an insulative layer formed beneath its surface by ion implantation or the equivalent, leaving a monocrystalline layer on the surface. The monocrystalline surface layer is then processed by preferential etching to accurately define components of the test structure. The substrate can be removed from the rear side of the insulative layer to form a transparent window, such that the test structure can be inspected by transmissive-optical techniques. Measurements made using electrical and optical techniques can be correlated with other measurements, including measurements made using scanning probe microscopy.
 [1];  [2];  [3];  [4];  [5]
  1. (Frederick, MD)
  2. (Ellicott City, MD)
  3. (Ijamsville, MD)
  4. (Germantown, MD)
  5. (Albuquerque, NM)
Issue Date:
OSTI Identifier:
United States of America as represented by Secretary of Commerce (Washington, DC) SNL
Patent Number(s):
US 5684301
Contract Number:
Research Org:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA
Country of Publication:
United States
monocrystalline; structures; calibrating; instruments; improved; structure; measurement; width; conductive; lines; formed; substrates; performed; semiconductor; fabrication; measurements; starting; material; insulative; layer; beneath; surface; implantation; equivalent; leaving; processed; preferential; etching; accurately; define; components; substrate; removed; rear; form; transparent; window; inspected; transmissive-optical; techniques; electrical; optical; correlated; including; scanning; probe; microscopy; transparent window; semiconductor fabrication; layer formed; starting material; surface layer; scanning probe; optical technique; probe microscopy; monocrystalline layer; crystalline layer; calibrating instruments; conductive lines; /250/257/