Semiconductor tunnel junction with enhancement layer
Abstract
The incorporation of a pseudomorphic GaAsSb layer in a runnel diode structure affords a new degree of freedom in designing runnel junctions for p-n junction device interconnects. Previously only doping levels could be varied to control the tunneling properties. This invention uses the valence band alignment band of the GaAsSb with respect to the surrounding materials to greatly relax the doping requirements for tunneling.
- Inventors:
-
- Sandia Park, NM
- Albuquerque, NM
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 871198
- Patent Number(s):
- 5679963
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01S - DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- semiconductor; tunnel; junction; enhancement; layer; incorporation; pseudomorphic; gaassb; runnel; diode; structure; affords; degree; freedom; designing; junctions; p-n; device; interconnects; previously; doping; levels; varied; control; tunneling; properties; valence; band; alignment; respect; surrounding; materials; greatly; relax; requirements; tunnel junction; p-n junction; valence band; structure affords; diode structure; gaassb layer; enhancement layer; sb layer; doping levels; junction device; /257/
Citation Formats
Klem, John F, and Zolper, John C. Semiconductor tunnel junction with enhancement layer. United States: N. p., 1997.
Web.
Klem, John F, & Zolper, John C. Semiconductor tunnel junction with enhancement layer. United States.
Klem, John F, and Zolper, John C. Wed .
"Semiconductor tunnel junction with enhancement layer". United States. https://www.osti.gov/servlets/purl/871198.
@article{osti_871198,
title = {Semiconductor tunnel junction with enhancement layer},
author = {Klem, John F and Zolper, John C},
abstractNote = {The incorporation of a pseudomorphic GaAsSb layer in a runnel diode structure affords a new degree of freedom in designing runnel junctions for p-n junction device interconnects. Previously only doping levels could be varied to control the tunneling properties. This invention uses the valence band alignment band of the GaAsSb with respect to the surrounding materials to greatly relax the doping requirements for tunneling.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1997},
month = {1}
}
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