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Title: Pulsed ion beam source

An improved pulsed ion beam source having a new biasing circuit for the fast magnetic field. This circuit provides for an initial negative bias for the field created by the fast coils in the ion beam source which pre-ionize the gas in the source, ionize the gas and deliver the gas to the proper position in the accelerating gap between the anode and cathode assemblies in the ion beam source. The initial negative bias improves the interaction between the location of the nulls in the composite magnetic field in the ion beam source and the position of the gas for pre-ionization and ionization into the plasma as well as final positioning of the plasma in the accelerating gap. Improvements to the construction of the flux excluders in the anode assembly are also accomplished by fabricating them as layered structures with a high melting point, low conductivity material on the outsides with a high conductivity material in the center.
  1. (Lansing, NY)
Issue Date:
OSTI Identifier:
Sandia Corporation (Albuquerque, NM) SNL
Patent Number(s):
US 5656819
Contract Number:
Research Org:
Country of Publication:
United States
pulsed; beam; source; improved; biasing; circuit; fast; magnetic; field; provides; initial; negative; bias; created; coils; pre-ionize; gas; ionize; deliver; proper; position; accelerating; gap; anode; cathode; assemblies; improves; interaction; location; nulls; composite; pre-ionization; ionization; plasma; final; positioning; improvements; construction; flux; excluders; assembly; accomplished; fabricating; layered; structures; melting; conductivity; material; outsides; center; layered structure; circuit provides; anode assembly; magnetic field; beam source; accelerating gap; proper position; negative bias; field created; cathode assemblies; conductivity material; fast coil; /250/315/