X-ray lithography using holographic images
Abstract
Methods for forming X-ray images having 0.25 .mu.m minimum line widths on X-ray sensitive material are presented. A holgraphic image of a desired circuit pattern is projected onto a wafer or other image-receiving substrate to allow recording of the desired image in photoresist material. In one embodiment, the method uses on-axis transmission and provides a high flux X-ray source having modest monochromaticity and coherence requirements. A layer of light-sensitive photoresist material on a wafer with a selected surface is provided to receive the image(s). The hologram has variable optical thickness and variable associated optical phase angle and amplitude attenuation for transmission of the X-rays. A second embodiment uses off-axis holography. The wafer receives the holographic image by grazing incidence reflection from a hologram printed on a flat metal or other highly reflecting surface or substrate. In this second embodiment, an X-ray beam with a high degree of monochromaticity and spatial coherence is required.
- Inventors:
-
- Berkeley, CA
- Sound Beach, NY
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- OSTI Identifier:
- 870875
- Patent Number(s):
- 5612986
- Assignee:
- Lawrence Berkeley Laboratory, University of CA (Berkeley, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G - PHYSICS G03 - PHOTOGRAPHY G03H - HOLOGRAPHIC PROCESSES OR APPARATUS
- DOE Contract Number:
- AC03-76SF00098
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- x-ray; lithography; holographic; images; methods; forming; 25; minimum; line; widths; sensitive; material; holgraphic; image; desired; circuit; pattern; projected; wafer; image-receiving; substrate; allow; recording; photoresist; embodiment; method; on-axis; transmission; provides; flux; source; modest; monochromaticity; coherence; requirements; layer; light-sensitive; selected; surface; provided; receive; hologram; variable; optical; thickness; associated; phase; angle; amplitude; attenuation; x-rays; off-axis; holography; receives; grazing; incidence; reflection; printed; flat; metal; highly; reflecting; beam; degree; spatial; required; x-ray image; selected surface; optical phase; optical thickness; resist material; x-ray lithography; phase angle; x-ray source; x-ray beam; reflecting surface; circuit pattern; sensitive material; x-ray sensitive; photoresist material; holographic image; holographic images; line width; line widths; x-ray images; minimum line; ray sensitive; desired circuit; /378/
Citation Formats
Howells, Malcolm S, and Jacobsen, Chris. X-ray lithography using holographic images. United States: N. p., 1997.
Web.
Howells, Malcolm S, & Jacobsen, Chris. X-ray lithography using holographic images. United States.
Howells, Malcolm S, and Jacobsen, Chris. Wed .
"X-ray lithography using holographic images". United States. https://www.osti.gov/servlets/purl/870875.
@article{osti_870875,
title = {X-ray lithography using holographic images},
author = {Howells, Malcolm S and Jacobsen, Chris},
abstractNote = {Methods for forming X-ray images having 0.25 .mu.m minimum line widths on X-ray sensitive material are presented. A holgraphic image of a desired circuit pattern is projected onto a wafer or other image-receiving substrate to allow recording of the desired image in photoresist material. In one embodiment, the method uses on-axis transmission and provides a high flux X-ray source having modest monochromaticity and coherence requirements. A layer of light-sensitive photoresist material on a wafer with a selected surface is provided to receive the image(s). The hologram has variable optical thickness and variable associated optical phase angle and amplitude attenuation for transmission of the X-rays. A second embodiment uses off-axis holography. The wafer receives the holographic image by grazing incidence reflection from a hologram printed on a flat metal or other highly reflecting surface or substrate. In this second embodiment, an X-ray beam with a high degree of monochromaticity and spatial coherence is required.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1997},
month = {1}
}
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Works referenced in this record:
Improved Resolution and Signal‐To‐Noise Ratios in Total Internal Reflection Holograms
journal, June 1968
- Stetson, Karl A.
- Applied Physics Letters, Vol. 12, Issue 11
Iterative Method Applied To Image Reconstruction And To Computer-Generated Holograms
journal, June 1980
- Fienup, J. R.
- Optical Engineering, Vol. 19, Issue 3
Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μm
journal, November 1990
- Bjorkholm, J. E.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 8, Issue 6
Resolution in Holography
journal, January 1969
- Champagne, Edwin B.; Massey, Norman G.
- Applied Optics, Vol. 8, Issue 9
Reflective systems design study for soft x-ray projection lithography
journal, November 1990
- Jewell, Tanya E.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 8, Issue 6
Holographic projection of microcircuit patterns
journal, January 1968
- Beesley, M. J.; Foster, H.; Hambleton, K. G.
- Electronics Letters, Vol. 4, Issue 3