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Title: X-ray lithography using holographic images

Methods for forming X-ray images having 0.25 .mu.m minimum line widths on X-ray sensitive material are presented. A holgraphic image of a desired circuit pattern is projected onto a wafer or other image-receiving substrate to allow recording of the desired image in photoresist material. In one embodiment, the method uses on-axis transmission and provides a high flux X-ray source having modest monochromaticity and coherence requirements. A layer of light-sensitive photoresist material on a wafer with a selected surface is provided to receive the image(s). The hologram has variable optical thickness and variable associated optical phase angle and amplitude attenuation for transmission of the X-rays. A second embodiment uses off-axis holography. The wafer receives the holographic image by grazing incidence reflection from a hologram printed on a flat metal or other highly reflecting surface or substrate. In this second embodiment, an X-ray beam with a high degree of monochromaticity and spatial coherence is required.
Inventors:
 [1];  [2]
  1. (Berkeley, CA)
  2. (Sound Beach, NY)
Issue Date:
OSTI Identifier:
870875
Assignee:
Lawrence Berkeley Laboratory, University of CA (Berkeley, CA) LBNL
Patent Number(s):
US 5612986
Contract Number:
AC03-76SF00098
Research Org:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
Country of Publication:
United States
Language:
English
Subject:
x-ray; lithography; holographic; images; methods; forming; 25; minimum; line; widths; sensitive; material; holgraphic; image; desired; circuit; pattern; projected; wafer; image-receiving; substrate; allow; recording; photoresist; embodiment; method; on-axis; transmission; provides; flux; source; modest; monochromaticity; coherence; requirements; layer; light-sensitive; selected; surface; provided; receive; hologram; variable; optical; thickness; associated; phase; angle; amplitude; attenuation; x-rays; off-axis; holography; receives; grazing; incidence; reflection; printed; flat; metal; highly; reflecting; beam; degree; spatial; required; x-ray image; selected surface; optical phase; optical thickness; resist material; x-ray lithography; phase angle; x-ray source; x-ray beam; reflecting surface; circuit pattern; sensitive material; x-ray sensitive; photoresist material; holographic image; holographic images; line width; line widths; x-ray images; minimum line; ray sensitive; desired circuit; /378/

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