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Title: Flow-through ion beam source

Abstract

A method and an apparatus for forming a charge neutral ion beam which is useful in producing thin films of material on electrically conductive or non-conductive substrates are provided.

Inventors:
 [1]
  1. Los Alamos, NM
Issue Date:
Research Org.:
Los Alamos National Laboratory (LANL), Los Alamos, NM
OSTI Identifier:
870819
Patent Number(s):
5601654
Assignee:
Regents of University of California, Office of Technology (Alameda, CA)
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
flow-through; beam; source; method; apparatus; forming; charge; neutral; useful; producing; films; material; electrically; conductive; non-conductive; substrates; provided; conductive substrate; electrically conductive; beam source; non-conductive substrate; charge neutral; non-conductive substrates; /118/156/250/427/438/

Citation Formats

Springer, Robert W. Flow-through ion beam source. United States: N. p., 1997. Web.
Springer, Robert W. Flow-through ion beam source. United States.
Springer, Robert W. Wed . "Flow-through ion beam source". United States. https://www.osti.gov/servlets/purl/870819.
@article{osti_870819,
title = {Flow-through ion beam source},
author = {Springer, Robert W},
abstractNote = {A method and an apparatus for forming a charge neutral ion beam which is useful in producing thin films of material on electrically conductive or non-conductive substrates are provided.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1997},
month = {1}
}

Patent:

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