Flow-through ion beam source
Abstract
A method and an apparatus for forming a charge neutral ion beam which is useful in producing thin films of material on electrically conductive or non-conductive substrates are provided.
- Inventors:
-
- Los Alamos, NM
- Issue Date:
- Research Org.:
- Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
- OSTI Identifier:
- 870819
- Patent Number(s):
- 5601654
- Assignee:
- Regents of University of California, Office of Technology (Alameda, CA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- W-7405-ENG-36
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- flow-through; beam; source; method; apparatus; forming; charge; neutral; useful; producing; films; material; electrically; conductive; non-conductive; substrates; provided; conductive substrate; electrically conductive; beam source; non-conductive substrate; charge neutral; non-conductive substrates; /118/156/250/427/438/
Citation Formats
Springer, Robert W. Flow-through ion beam source. United States: N. p., 1997.
Web.
Springer, Robert W. Flow-through ion beam source. United States.
Springer, Robert W. Wed .
"Flow-through ion beam source". United States. https://www.osti.gov/servlets/purl/870819.
@article{osti_870819,
title = {Flow-through ion beam source},
author = {Springer, Robert W},
abstractNote = {A method and an apparatus for forming a charge neutral ion beam which is useful in producing thin films of material on electrically conductive or non-conductive substrates are provided.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1997},
month = {1}
}
Works referenced in this record:
Technology of ion beam sources used in sputtering
journal, March 1978
- Kaufman, Harold R.
- Journal of Vacuum Science and Technology, Vol. 15, Issue 2