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Title: Computer-aided engineering system for design of sequence arrays and lithographic masks

An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks.
 [1];  [2];  [3];  [2]
  1. (Mt. View, CA)
  2. (Palo Alto, CA)
  3. (San Jose, CA)
Issue Date:
OSTI Identifier:
Affymetrix, Inc. (Santa Clara, CA) OAK
Patent Number(s):
US 5593839
Contract Number:
Research Org:
Affymax Research Institute
Country of Publication:
United States
computer-aided; engineering; design; sequence; arrays; lithographic; masks; improved; set; computer; tools; forming; according; aspect; select; probes; layout; array; dna; polymers; beneficial; characteristics; chip; files; generate; lithographic masks; sequence arrays; select probes; beneficial characteristics; computer tools; computer-aided engineering; chip design; generate lithographic; design files; improved set; forming arrays; lithographic mask; /435/430/999/