Computer-aided engineering system for design of sequence arrays and lithographic masks
Abstract
An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks.
- Inventors:
-
- Mt. View, CA
- Palo Alto, CA
- San Jose, CA
- Issue Date:
- Research Org.:
- Affymax Research Institute
- OSTI Identifier:
- 870782
- Patent Number(s):
- 5593839
- Assignee:
- Affymetrix, Inc. (Santa Clara, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
C - CHEMISTRY C07 - ORGANIC CHEMISTRY C07K - PEPTIDES
- DOE Contract Number:
- FG03-92ER81275
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- computer-aided; engineering; design; sequence; arrays; lithographic; masks; improved; set; computer; tools; forming; according; aspect; select; probes; layout; array; dna; polymers; beneficial; characteristics; chip; files; generate; lithographic masks; sequence arrays; select probes; beneficial characteristics; computer tools; computer-aided engineering; chip design; generate lithographic; design files; improved set; forming arrays; lithographic mask; /435/430/999/
Citation Formats
Hubbell, Earl A, Lipshutz, Robert J, Morris, Macdonald S, and Winkler, James L. Computer-aided engineering system for design of sequence arrays and lithographic masks. United States: N. p., 1997.
Web.
Hubbell, Earl A, Lipshutz, Robert J, Morris, Macdonald S, & Winkler, James L. Computer-aided engineering system for design of sequence arrays and lithographic masks. United States.
Hubbell, Earl A, Lipshutz, Robert J, Morris, Macdonald S, and Winkler, James L. Wed .
"Computer-aided engineering system for design of sequence arrays and lithographic masks". United States. https://www.osti.gov/servlets/purl/870782.
@article{osti_870782,
title = {Computer-aided engineering system for design of sequence arrays and lithographic masks},
author = {Hubbell, Earl A and Lipshutz, Robert J and Morris, Macdonald S and Winkler, James L},
abstractNote = {An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1997},
month = {1}
}
Works referenced in this record:
Light-directed, spatially addressable parallel chemical synthesis
journal, February 1991
- Fodor, S.; Read, J.; Pirrung, M.
- Science, Vol. 251, Issue 4995