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Title: Method and device for predicting wavelength dependent radiation influences in thermal systems

A method and apparatus for predicting the spectral (wavelength-dependent) radiation transport in thermal systems including interaction by the radiation with partially transmitting medium. The predicted model of the thermal system is used to design and control the thermal system. The predictions are well suited to be implemented in design and control of rapid thermal processing (RTP) reactors. The method involves generating a spectral thermal radiation transport model of an RTP reactor. The method also involves specifying a desired wafer time dependent temperature profile. The method further involves calculating an inverse of the generated model using the desired wafer time dependent temperature to determine heating element parameters required to produce the desired profile. The method also involves controlling the heating elements of the RTP reactor in accordance with the heating element parameters to heat the wafer in accordance with the desired profile.
 [1];  [2]
  1. (864 Lucille St., Livermore, CA 94550)
  2. (7329 Stonedale Dr., Pleasanton, CA 94558)
Issue Date:
OSTI Identifier:
Kee, Robert J. (864 Lucille St., Livermore, CA 94550);Ting, Aili (7329 Stonedale Dr., Pleasanton, CA 94558) SNL
Patent Number(s):
US 5583780
Contract Number:
Research Org:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA
Country of Publication:
United States
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