Optical processing furnace with quartz muffle and diffuser plate
Abstract
An optical furnace for annealing a process wafer comprising a source of optical energy, a quartz muffle having a door to hold the wafer for processing, and a quartz diffuser plate to diffuse the light impinging on the quartz muffle; a feedback system with a light sensor located in the wall of the muffle is also provided for controlling the source of optical energy.
- Inventors:
-
- Denver, CO
- Issue Date:
- Research Org.:
- Midwest Research Institute, Kansas City, MO (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 870695
- Patent Number(s):
- 5577157
- Assignee:
- Midwest Research Institute (Kansas City, MO)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05B - ELECTRIC HEATING
- DOE Contract Number:
- AC02-83CH10093
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- optical; processing; furnace; quartz; muffle; diffuser; plate; annealing; process; wafer; comprising; source; energy; door; hold; diffuse; light; impinging; feedback; sensor; located; wall; provided; controlling; quartz muffle; diffuser plate; light sensor; optical energy; optical furnace; optical processing; quartz diffuser; light impinging; wafer comprising; optical process; processing furnace; process wafer; /392/118/216/219/250/359/427/438/
Citation Formats
Sopori, Bhushan L. Optical processing furnace with quartz muffle and diffuser plate. United States: N. p., 1996.
Web.
Sopori, Bhushan L. Optical processing furnace with quartz muffle and diffuser plate. United States.
Sopori, Bhushan L. Mon .
"Optical processing furnace with quartz muffle and diffuser plate". United States. https://www.osti.gov/servlets/purl/870695.
@article{osti_870695,
title = {Optical processing furnace with quartz muffle and diffuser plate},
author = {Sopori, Bhushan L},
abstractNote = {An optical furnace for annealing a process wafer comprising a source of optical energy, a quartz muffle having a door to hold the wafer for processing, and a quartz diffuser plate to diffuse the light impinging on the quartz muffle; a feedback system with a light sensor located in the wall of the muffle is also provided for controlling the source of optical energy.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 1996},
month = {Mon Jan 01 00:00:00 EST 1996}
}
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