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Title: Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

Method and apparatus for producing extreme ultra violet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10.sup.11 -10.sup.12 watts/cm.sup.2) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10-30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle.
 [1];  [2]
  1. (124 Turquoise Way, Livermore, Alameda County, CA 94550)
  2. (CREOL
Issue Date:
OSTI Identifier:
Kublak, Glenn D. (124 Turquoise Way, Livermore, Alameda County, CA 94550);Richardson, Martin C. (CREOL;University Central Florida, 12424 Research Pkwy., Orlando, Orande County, FL 32826) SNL
Patent Number(s):
US 5577092
Contract Number:
Research Org:
Country of Publication:
United States
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