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Title: Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

Method and apparatus for producing extreme ultra violet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10.sup.11 -10.sup.12 watts/cm.sup.2) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10-30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle.
Inventors:
 [1];  [2]
  1. (124 Turquoise Way, Livermore, Alameda County, CA 94550)
  2. (CREOL
Issue Date:
OSTI Identifier:
870694
Assignee:
Kublak, Glenn D. (124 Turquoise Way, Livermore, Alameda County, CA 94550);Richardson, Martin C. (CREOL;University Central Florida, 12424 Research Pkwy., Orlando, Orande County, FL 32826) SNL
Patent Number(s):
US 5577092
Contract Number:
AC04-94AL85000
Research Org:
SANDIA CORP
Country of Publication:
United States
Language:
English
Subject:
cluster; beam; targets; laser; plasma; extreme; ultraviolet; soft; x-ray; sources; method; apparatus; producing; ultra; violet; euv; radiation; ultra-low; debris; source; disclosed; produced; free; jet; expansion; various; gases; temperature; controlled; nozzle; form; molecular; clusters; target; subsequently; irradiated; commercially; available; lasers; moderate; intensity; 10; 11; -10; 12; watts; cm; produce; radiating; region; 100; nanometers; appropriate; adjustment; experimental; conditions; focus; moved; 10-30; eliminating; erosion; various gases; temperature controlled; free jet; beam target; laser focus; laser plasma; temperature control; x-ray source; plasma source; extreme ultraviolet; soft x-ray; commercially available; x-ray radiation; ultra violet; ray radiation; x-ray sources; plasma extreme; available laser; /378/

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