Computer-aided engineering system for design of sequence arrays and lithographic masks
Abstract
An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system (100) is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files (104) to design and/or generate lithographic masks (110).
- Inventors:
-
- Mt. View, CA
- San Jose, CA
- Palo Alto, CA
- Issue Date:
- Research Org.:
- Affymax Research Institute
- OSTI Identifier:
- 870673
- Patent Number(s):
- 5571639
- Assignee:
- Affymax Technologies N.V. (Curaco, AN)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
- DOE Contract Number:
- FG03-92ER81275
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- computer-aided; engineering; design; sequence; arrays; lithographic; masks; improved; set; computer; tools; forming; according; aspect; 100; select; probes; layout; array; dna; polymers; beneficial; characteristics; chip; files; 104; generate; 110; lithographic masks; sequence arrays; select probes; beneficial characteristics; computer tools; computer-aided engineering; chip design; generate lithographic; design files; improved set; forming arrays; lithographic mask; /430/435/
Citation Formats
Hubbell, Earl A, Morris, MacDonald S, and Winkler, James L. Computer-aided engineering system for design of sequence arrays and lithographic masks. United States: N. p., 1996.
Web.
Hubbell, Earl A, Morris, MacDonald S, & Winkler, James L. Computer-aided engineering system for design of sequence arrays and lithographic masks. United States.
Hubbell, Earl A, Morris, MacDonald S, and Winkler, James L. Mon .
"Computer-aided engineering system for design of sequence arrays and lithographic masks". United States. https://www.osti.gov/servlets/purl/870673.
@article{osti_870673,
title = {Computer-aided engineering system for design of sequence arrays and lithographic masks},
author = {Hubbell, Earl A and Morris, MacDonald S and Winkler, James L},
abstractNote = {An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system (100) is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files (104) to design and/or generate lithographic masks (110).},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 1996},
month = {Mon Jan 01 00:00:00 EST 1996}
}
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Works referenced in this record:
Light-directed, spatially addressable parallel chemical synthesis
journal, February 1991
- Fodor, S.; Read, J.; Pirrung, M.
- Science, Vol. 251, Issue 4995