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Title: Multi-gap high impedance plasma opening switch

Abstract

A high impedance plasma opening switch having an anode and a cathode and at least one additional electrode placed between the anode and cathode. The presence of the additional electrodes leads to the creation of additional plasma gaps which are in series, increasing the net impedance of the switch. An equivalent effect can be obtained by using two or more conventional plasma switches with their plasma gaps wired in series. Higher impedance switches can provide high current and voltage to higher impedance loads such as plasma radiation sources.

Inventors:
 [1]
  1. Los Alamos, NM
Issue Date:
Research Org.:
Los Alamos National Laboratory (LANL), Los Alamos, NM
OSTI Identifier:
870655
Patent Number(s):
5568019
Assignee:
Regents of University of California (Oakland, CA)
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
multi-gap; impedance; plasma; switch; anode; cathode; additional; electrode; placed; presence; electrodes; leads; creation; gaps; series; increasing; net; equivalent; effect; obtained; conventional; switches; wired; provide; current; voltage; loads; radiation; sources; radiation source; radiation sources; conventional plasma; electrode placed; impedance plasma; additional electrode; plasma radiation; additional electrodes; /315/313/

Citation Formats

Mason, Rodney J. Multi-gap high impedance plasma opening switch. United States: N. p., 1996. Web.
Mason, Rodney J. Multi-gap high impedance plasma opening switch. United States.
Mason, Rodney J. Mon . "Multi-gap high impedance plasma opening switch". United States. https://www.osti.gov/servlets/purl/870655.
@article{osti_870655,
title = {Multi-gap high impedance plasma opening switch},
author = {Mason, Rodney J},
abstractNote = {A high impedance plasma opening switch having an anode and a cathode and at least one additional electrode placed between the anode and cathode. The presence of the additional electrodes leads to the creation of additional plasma gaps which are in series, increasing the net impedance of the switch. An equivalent effect can be obtained by using two or more conventional plasma switches with their plasma gaps wired in series. Higher impedance switches can provide high current and voltage to higher impedance loads such as plasma radiation sources.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1996},
month = {1}
}

Patent:

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