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Title: Propenyl ether monomers for photopolymerization

Propenyl ether monomers of formula V A(OCH.dbd.CHCH.sub.3).sub.n wherein n is an integer from one to six and A is selected from cyclic ethers, polyether and alkanes are disclosed. The monomers are readily polymerized in the presence of cationic photoinitiators, when exposed to actinic radiation, to form poly(propenyl ethers) that are useful for coatings, sealants, varnishes and adhesives. Compositions for preparing polymeric coatings comprising the compounds of formula V together with particular cationic photoinitiators are also disclosed, as are processes for making the monomers from allyl halides and readily available alcohols. The process involves rearranging the resulting allyl ethers to propenyl ethers.
  1. (Clifton Park, NY)
Issue Date:
OSTI Identifier:
Rensselaer Polytechnic Institute (Troy, NY) CHO
Patent Number(s):
US 5567858
Contract Number:
Research Org:
Rensselaer Polytechnic Inst., Troy, NY (United States)
Country of Publication:
United States
propenyl; monomers; photopolymerization; formula; och; dbd; chch; integer; six; selected; cyclic; ethers; polyether; alkanes; disclosed; readily; polymerized; presence; cationic; photoinitiators; exposed; actinic; radiation; form; poly; useful; coatings; sealants; varnishes; adhesives; compositions; preparing; polymeric; comprising; compounds; particular; processes; allyl; halides; available; alcohols; process; involves; rearranging; resulting; cationic photoinitiators; polymeric coating; polymeric coatings; propenyl ethers; process involves; readily available; form poly; cationic photoinitiator; cyclic ethers; /999/522/