Broad beam ion implanter
Abstract
An ion implantation device for creating a large diameter, homogeneous, ion beam is described, as well as a method for creating same, wherein the device is characterized by extraction of a diverging ion beam and its conversion by ion beam optics to an essentially parallel ion beam. The device comprises a plasma or ion source, an anode and exit aperture, an extraction electrode, a divergence-limiting electrode and an acceleration electrode, as well as the means for connecting a voltage supply to the electrodes.
- Inventors:
-
- Hercules, CA
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- OSTI Identifier:
- 870632
- Patent Number(s):
- 5563418
- Assignee:
- Regents, University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- AC03-76SF00098
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- broad; beam; implanter; implantation; device; creating; diameter; homogeneous; described; method; characterized; extraction; diverging; conversion; optics; essentially; parallel; comprises; plasma; source; anode; exit; aperture; electrode; divergence-limiting; acceleration; means; connecting; voltage; supply; electrodes; voltage supply; device comprises; exit aperture; extraction electrode; essentially parallel; /250/
Citation Formats
Leung, Ka-Ngo. Broad beam ion implanter. United States: N. p., 1996.
Web.
Leung, Ka-Ngo. Broad beam ion implanter. United States.
Leung, Ka-Ngo. Mon .
"Broad beam ion implanter". United States. https://www.osti.gov/servlets/purl/870632.
@article{osti_870632,
title = {Broad beam ion implanter},
author = {Leung, Ka-Ngo},
abstractNote = {An ion implantation device for creating a large diameter, homogeneous, ion beam is described, as well as a method for creating same, wherein the device is characterized by extraction of a diverging ion beam and its conversion by ion beam optics to an essentially parallel ion beam. The device comprises a plasma or ion source, an anode and exit aperture, an extraction electrode, a divergence-limiting electrode and an acceleration electrode, as well as the means for connecting a voltage supply to the electrodes.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1996},
month = {1}
}