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Title: Substrate heater for thin film deposition

A substrate heater for thin film deposition of metallic oxides upon a target substrate configured as a disk including means for supporting in a predetermined location a target substrate configured as a disk, means for rotating the target substrate within the support means, means for heating the target substrate within the support means, the heating means about the support means and including a pair of heating elements with one heater element situated on each side of the predetermined location for the target substrate, with one heater element defining an opening through which desired coating material can enter for thin film deposition and with the heating means including an opening slot through which the target substrate can be entered into the support means, and, optionally a means for thermal shielding of the heating means from surrounding environment is disclosed.
Inventors:
 [1]
  1. (111 Beryl St., Los Alamos, NM 87544)
Issue Date:
OSTI Identifier:
870596
Assignee:
Foltyn, Steve R. (111 Beryl St., Los Alamos, NM 87544) LANL
Patent Number(s):
US 5554224
Contract Number:
W-7405-ENG-36
Research Org:
Los Alamos National Laboratory (LANL), Los Alamos, NM
Country of Publication:
United States
Language:
English
Subject:
substrate; heater; film; deposition; metallic; oxides; target; configured; disk; including; means; supporting; predetermined; location; rotating; support; heating; pair; elements; element; situated; defining; desired; coating; material; enter; slot; entered; optionally; thermal; shielding; surrounding; environment; disclosed; surrounding environment; including means; means including; heating elements; film deposition; coating material; heating means; heating element; support means; predetermined location; target substrate; metallic oxides; heater element; substrate configured; substrate heater; metallic oxide; thermal shield; disk including; /118/204/

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