Magnetic filter apparatus and method for generating cold plasma in semicoductor processing
Abstract
Disclosed herein is a system and method for providing a plasma flood having a low electron temperature to a semiconductor target region during an ion implantation process. The plasma generator providing the plasma is coupled to a magnetic filter which allows ions and low energy electrons to pass therethrough while retaining captive the primary or high energy electrons. The ions and low energy electrons form a "cold plasma" which is diffused in the region of the process surface while the ion implantation process takes place.
- Inventors:
-
- San Leandro, CA
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- OSTI Identifier:
- 870553
- Patent Number(s):
- 5545257
- Assignee:
- Electro-Graph, Inc. (Carlsbad, CA)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- AC03-76SF00098
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- magnetic; filter; apparatus; method; generating; cold; plasma; semicoductor; processing; disclosed; providing; flood; electron; temperature; semiconductor; target; region; implantation; process; generator; coupled; allows; energy; electrons; pass; therethrough; retaining; captive; primary; form; diffused; surface; takes; plasma generator; target region; magnetic filter; energy electrons; energy electron; pass therethrough; filter apparatus; implantation process; electron temperature; /118/250/
Citation Formats
Vella, Michael C. Magnetic filter apparatus and method for generating cold plasma in semicoductor processing. United States: N. p., 1996.
Web.
Vella, Michael C. Magnetic filter apparatus and method for generating cold plasma in semicoductor processing. United States.
Vella, Michael C. Mon .
"Magnetic filter apparatus and method for generating cold plasma in semicoductor processing". United States. https://www.osti.gov/servlets/purl/870553.
@article{osti_870553,
title = {Magnetic filter apparatus and method for generating cold plasma in semicoductor processing},
author = {Vella, Michael C},
abstractNote = {Disclosed herein is a system and method for providing a plasma flood having a low electron temperature to a semiconductor target region during an ion implantation process. The plasma generator providing the plasma is coupled to a magnetic filter which allows ions and low energy electrons to pass therethrough while retaining captive the primary or high energy electrons. The ions and low energy electrons form a "cold plasma" which is diffused in the region of the process surface while the ion implantation process takes place.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1996},
month = {1}
}
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Works referenced in this record:
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- Tanaka, Shigeru; Akiba, Masato; Horiike, Hiroshi
- Review of Scientific Instruments, Vol. 57, Issue 2
Development of a high proton yield plasma source with multipole confinement and a magnetic filter
journal, August 1987
- Holmes, A. J. T.; Green, T. S.; Newman, A. F.
- Review of Scientific Instruments, Vol. 58, Issue 8