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Title: Magnetic filter apparatus and method for generating cold plasma in semicoductor processing

Disclosed herein is a system and method for providing a plasma flood having a low electron temperature to a semiconductor target region during an ion implantation process. The plasma generator providing the plasma is coupled to a magnetic filter which allows ions and low energy electrons to pass therethrough while retaining captive the primary or high energy electrons. The ions and low energy electrons form a "cold plasma" which is diffused in the region of the process surface while the ion implantation process takes place.
  1. (San Leandro, CA)
Issue Date:
OSTI Identifier:
Electro-Graph, Inc. (Carlsbad, CA) LBNL
Patent Number(s):
US 5545257
Contract Number:
Research Org:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
Country of Publication:
United States
magnetic; filter; apparatus; method; generating; cold; plasma; semicoductor; processing; disclosed; providing; flood; electron; temperature; semiconductor; target; region; implantation; process; generator; coupled; allows; energy; electrons; pass; therethrough; retaining; captive; primary; form; diffused; surface; takes; plasma generator; target region; magnetic filter; energy electrons; energy electron; pass therethrough; filter apparatus; implantation process; electron temperature; /118/250/