Pulsed ion beam source

Greenly, John B

Title: Pulsed ion beam source

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Abstract

An improved magnetically-confined anode plasma pulsed ion beam source. Beam rotation effects and power efficiency are improved by a magnetic design which places the separatrix between the fast field flux structure and the slow field structure near the anode of the ion beam source, by a gas port design which localizes the gas delivery into the gap between the fast coil and the anode, by a pre-ionizer ringing circuit connected to the fast coil, and by a bias field means which optimally adjusts the plasma formation position in the ion beam source.

Inventors:

Greenly, John B ^[1]

Lansing, NY

Issue Date:: 1996-01-01

Research Org.:: AT&T

OSTI Identifier:: 870461

Patent Number(s):: 5525805

Assignee:: Sandia Corporation (Albuquerque, NM)

Patent Classifications (CPCs):: B - PERFORMING OPERATIONS B29 - WORKING OF PLASTICS B29C - SHAPING OR JOINING OF PLASTICS

C - CHEMISTRY C08 - ORGANIC MACROMOLECULAR COMPOUNDS C08J - WORKING-UP

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B - PERFORMING OPERATIONS B29 - WORKING OF PLASTICS B29C - SHAPING OR JOINING OF PLASTICS
B29C2035/0872 - {using ion-radiation, e.g. alpha-rays}
B29C59/16 - by wave energy or particle radiation {, e.g. infra-red heating

C - CHEMISTRY C08 - ORGANIC MACROMOLECULAR COMPOUNDS C08J - WORKING-UP
C08J7/123 - {Treatment by wave energy or particle radiation

C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C14/48 - Ion implantation
C23C8/36 - using ionised gases, e.g. ionitriding

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J2237/08 - Ion sources
H01J2237/31701 - Ion implantation
H01J27/14 - Other arc discharge ion sources using an applied magnetic field

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DOE Contract Number:: AC04-76DP00789

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: pulsed; beam; source; improved; magnetically-confined; anode; plasma; rotation; effects; power; efficiency; magnetic; design; separatrix; fast; field; flux; structure; slow; near; gas; localizes; delivery; gap; coil; pre-ionizer; ringing; circuit; connected; bias; means; optimally; adjusts; formation; position; circuit connected; beam source; gas delivery; field flux; bias field; power efficiency; plasma formation; field means; improved magnetic; fast coil; /250/315/

Citation Formats


                    Greenly, John B. Pulsed ion beam source.  United States: N. p., 1996. 
        Web.

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                    Greenly, John B. Pulsed ion beam source.  United States.

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                    Greenly, John B. Mon .  
        "Pulsed ion beam source".  United States.  https://www.osti.gov/servlets/purl/870461.

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@article{osti_870461,

  title        = {Pulsed ion beam source},

  author       = {Greenly, John B},

  abstractNote = {An improved magnetically-confined anode plasma pulsed ion beam source. Beam rotation effects and power efficiency are improved by a magnetic design which places the separatrix between the fast field flux structure and the slow field structure near the anode of the ion beam source, by a gas port design which localizes the gas delivery into the gap between the fast coil and the anode, by a pre-ionizer ringing circuit connected to the fast coil, and by a bias field means which optimally adjusts the plasma formation position in the ion beam source.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1996},

  month        = {1}

}

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