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Title: Method for sputtering with low frequency alternating current

Low frequency alternating current sputtering is provided by connecting a low frequency alternating current source to a high voltage transformer having outer taps and a center tap for stepping up the voltage of the alternating current. The center tap of the transformer is connected to a vacuum vessel containing argon or helium gas. Target electrodes, in close proximity to each other, and containing material with which the substrates will be coated, are connected to the outer taps of the transformer. With an applied potential, the gas will ionize and sputtering from the target electrodes onto the substrate will then result. The target electrodes can be copper or boron, and the substrate can be stainless steel, aluminum, or titanium. Copper coatings produced are used in place of nickel and/or copper striking.
  1. (Allentown, NJ)
Issue Date:
OSTI Identifier:
United States of America as represented by United States (Washington, DC) PPPL
Patent Number(s):
US 5512164
Contract Number:
Research Org:
Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ
Country of Publication:
United States
method; sputtering; frequency; alternating; current; provided; connecting; source; voltage; transformer; outer; taps; center; tap; stepping; connected; vacuum; vessel; containing; argon; helium; gas; target; electrodes; close; proximity; material; substrates; coated; applied; potential; ionize; substrate; result; copper; boron; stainless; steel; aluminum; titanium; coatings; produced; nickel; striking; vacuum vessel; close proximity; stainless steel; alternating current; current source; vessel containing; helium gas; target electrode; applied potential; containing material; frequency alternating; copper coating; current sputtering; /205/204/