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Title: Continuous, real time microwave plasma element sensor

Abstract

Microwave-induced plasma for continuous, real time trace element monitoring under harsh and variable conditions. The sensor includes a source of high power microwave energy and a shorted waveguide made of a microwave conductive, refractory material communicating with the source of the microwave energy to generate a plasma. The high power waveguide is constructed to be robust in a hot, hostile environment. It includes an aperture for the passage of gases to be analyzed and a spectrometer is connected to receive light from the plasma. Provision is made for real time in situ calibration. The spectrometer disperses the light, which is then analyzed by a computer. The sensor is capable of making continuous, real time quantitative measurements of desired elements, such as the heavy metals lead and mercury.

Inventors:
 [1];  [2];  [3];  [4];  [5];  [6]
  1. 4 Ledgewood Dr., Bedford, MA 01730
  2. 10 Village Hill Rd., Belmont, MA 02178
  3. 26 Walnut Hill Rd., Chestnut Hill, MA 02167
  4. 1740 Conestoga Rd., Chester Springs, PA 19425
  5. 323 Echo Valley La., Newton Square, PA 19072
  6. 806 Brian La., Kennewick, WA 99337
Issue Date:
Research Org.:
Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
OSTI Identifier:
870227
Patent Number(s):
5479254
Assignee:
Woskov, Paul P. (4 Ledgewood Dr., Bedford, MA 01730);Smatlak, Donna L. (10 Village Hill Rd., Belmont, MA 02178);Cohn, Daniel R. (26 Walnut Hill Rd., Chestnut Hill, MA 02167);Wittle, J. Kenneth (1740 Conestoga Rd., Chester Springs, PA 19425);Titus, Charles H. (323 Echo Valley La., Newton Square, PA 19072);Surma, Jeffrey E. (806 Brian La., Kennewick, WA 99337)
Patent Classifications (CPCs):
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
DOE Contract Number:  
AC06-76RL01830
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
continuous; time; microwave; plasma; element; sensor; microwave-induced; trace; monitoring; harsh; variable; conditions; source; power; energy; shorted; waveguide; conductive; refractory; material; communicating; generate; constructed; robust; hot; hostile; environment; aperture; passage; gases; analyzed; spectrometer; connected; receive; light; provision; situ; calibration; disperses; computer; capable; quantitative; measurements; desired; elements; heavy; metals; lead; mercury; trace element; heavy metal; refractory material; microwave energy; heavy metals; microwave plasma; wave energy; hostile environment; receive light; power microwave; spectrometer disperses; quantitative measurements; situ calibration; shorted waveguide; quantitative measure; microwave-induced plasma; variable conditions; time trace; element monitoring; quantitative measurement; /356/333/

Citation Formats

Woskov, Paul P, Smatlak, Donna L, Cohn, Daniel R, Wittle, J Kenneth, Titus, Charles H, and Surma, Jeffrey E. Continuous, real time microwave plasma element sensor. United States: N. p., 1995. Web.
Woskov, Paul P, Smatlak, Donna L, Cohn, Daniel R, Wittle, J Kenneth, Titus, Charles H, & Surma, Jeffrey E. Continuous, real time microwave plasma element sensor. United States.
Woskov, Paul P, Smatlak, Donna L, Cohn, Daniel R, Wittle, J Kenneth, Titus, Charles H, and Surma, Jeffrey E. Sun . "Continuous, real time microwave plasma element sensor". United States. https://www.osti.gov/servlets/purl/870227.
@article{osti_870227,
title = {Continuous, real time microwave plasma element sensor},
author = {Woskov, Paul P and Smatlak, Donna L and Cohn, Daniel R and Wittle, J Kenneth and Titus, Charles H and Surma, Jeffrey E},
abstractNote = {Microwave-induced plasma for continuous, real time trace element monitoring under harsh and variable conditions. The sensor includes a source of high power microwave energy and a shorted waveguide made of a microwave conductive, refractory material communicating with the source of the microwave energy to generate a plasma. The high power waveguide is constructed to be robust in a hot, hostile environment. It includes an aperture for the passage of gases to be analyzed and a spectrometer is connected to receive light from the plasma. Provision is made for real time in situ calibration. The spectrometer disperses the light, which is then analyzed by a computer. The sensor is capable of making continuous, real time quantitative measurements of desired elements, such as the heavy metals lead and mercury.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {1}
}

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Works referenced in this record:

Microwave Discharge Cavities Operating at 2450 MHz
journal, March 1965


A novel microwave plasma cavity assembly for atomic emission spectrometry
journal, September 1992


Application of weakly ionized plasmas for materials sampling and analysis
journal, January 1991


Design concepts for strip-line microwave spectrochemical sources
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Microwave-Supported Discharges
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An assessment of a microwave-induced plasma generated in argon with a cylindrical TM010 cavity as an excitation source for emission spectrometric analysis of solutions
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Atomic emission spectrometry of solid samples with laser vaporization-microwave induced plasma system
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Comparison of microwave-induced plasma sources
journal, January 1991


A Review of Instrumentation Used to Generate Microwave-Induced Plasmas
journal, November 1984