skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Continuous, real time microwave plasma element sensor

Abstract

Microwave-induced plasma for continuous, real time trace element monitoring under harsh and variable conditions. The sensor includes a source of high power microwave energy and a shorted waveguide made of a microwave conductive, refractory material communicating with the source of the microwave energy to generate a plasma. The high power waveguide is constructed to be robust in a hot, hostile environment. It includes an aperture for the passage of gases to be analyzed and a spectrometer is connected to receive light from the plasma. Provision is made for real time in situ calibration. The spectrometer disperses the light, which is then analyzed by a computer. The sensor is capable of making continuous, real time quantitative measurements of desired elements, such as the heavy metals lead and mercury.

Inventors:
 [1];  [2];  [3];  [4];  [5];  [6]
  1. (4 Ledgewood Dr., Bedford, MA 01730)
  2. (10 Village Hill Rd., Belmont, MA 02178)
  3. (26 Walnut Hill Rd., Chestnut Hill, MA 02167)
  4. (1740 Conestoga Rd., Chester Springs, PA 19425)
  5. (323 Echo Valley La., Newton Square, PA 19072)
  6. (806 Brian La., Kennewick, WA 99337)
Issue Date:
Research Org.:
Pacific Northwest National Laboratory (PNNL), Richland, WA
OSTI Identifier:
870227
Patent Number(s):
5479254
Assignee:
Woskov, Paul P. (4 Ledgewood Dr., Bedford, MA 01730);Smatlak, Donna L. (10 Village Hill Rd., Belmont, MA 02178);Cohn, Daniel R. (26 Walnut Hill Rd., Chestnut Hill, MA 02167);Wittle, J. Kenneth (1740 Conestoga Rd., Chester Springs, PA 19425);Titus, Charles H. (323 Echo Valley La., Newton Square, PA 19072);Surma, Jeffrey E. (806 Brian La., Kennewick, WA 99337) PNNL
DOE Contract Number:  
AC06-76RL01830
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
continuous; time; microwave; plasma; element; sensor; microwave-induced; trace; monitoring; harsh; variable; conditions; source; power; energy; shorted; waveguide; conductive; refractory; material; communicating; generate; constructed; robust; hot; hostile; environment; aperture; passage; gases; analyzed; spectrometer; connected; receive; light; provision; situ; calibration; disperses; computer; capable; quantitative; measurements; desired; elements; heavy; metals; lead; mercury; trace element; heavy metal; refractory material; microwave energy; heavy metals; microwave plasma; wave energy; hostile environment; receive light; power microwave; spectrometer disperses; quantitative measurements; situ calibration; shorted waveguide; quantitative measure; microwave-induced plasma; variable conditions; time trace; element monitoring; quantitative measurement; /356/333/

Citation Formats

Woskov, Paul P., Smatlak, Donna L., Cohn, Daniel R., Wittle, J. Kenneth, Titus, Charles H., and Surma, Jeffrey E. Continuous, real time microwave plasma element sensor. United States: N. p., 1995. Web.
Woskov, Paul P., Smatlak, Donna L., Cohn, Daniel R., Wittle, J. Kenneth, Titus, Charles H., & Surma, Jeffrey E. Continuous, real time microwave plasma element sensor. United States.
Woskov, Paul P., Smatlak, Donna L., Cohn, Daniel R., Wittle, J. Kenneth, Titus, Charles H., and Surma, Jeffrey E. Sun . "Continuous, real time microwave plasma element sensor". United States. https://www.osti.gov/servlets/purl/870227.
@article{osti_870227,
title = {Continuous, real time microwave plasma element sensor},
author = {Woskov, Paul P. and Smatlak, Donna L. and Cohn, Daniel R. and Wittle, J. Kenneth and Titus, Charles H. and Surma, Jeffrey E.},
abstractNote = {Microwave-induced plasma for continuous, real time trace element monitoring under harsh and variable conditions. The sensor includes a source of high power microwave energy and a shorted waveguide made of a microwave conductive, refractory material communicating with the source of the microwave energy to generate a plasma. The high power waveguide is constructed to be robust in a hot, hostile environment. It includes an aperture for the passage of gases to be analyzed and a spectrometer is connected to receive light from the plasma. Provision is made for real time in situ calibration. The spectrometer disperses the light, which is then analyzed by a computer. The sensor is capable of making continuous, real time quantitative measurements of desired elements, such as the heavy metals lead and mercury.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {1}
}

Patent:

Save / Share: