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Title: Fabrication of amorphous diamond films

Abstract

Amorphous diamond films having a significant reduction in intrinsic stress are prepared by biasing a substrate to be coated and depositing carbon ions thereon under controlled temperature conditions.

Inventors:
 [1]
  1. Livermore, CA
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
870201
Patent Number(s):
5474816
Assignee:
Regents of University of California (Oakland, CA)
Patent Classifications (CPCs):
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
fabrication; amorphous; diamond; films; significant; reduction; intrinsic; stress; prepared; biasing; substrate; coated; depositing; carbon; thereon; controlled; temperature; conditions; amorphous diamond; temperature conditions; controlled temperature; significant reduction; diamond film; diamond films; depositing carbon; intrinsic stress; /427/423/

Citation Formats

Falabella, Steven. Fabrication of amorphous diamond films. United States: N. p., 1995. Web.
Falabella, Steven. Fabrication of amorphous diamond films. United States.
Falabella, Steven. Sun . "Fabrication of amorphous diamond films". United States. https://www.osti.gov/servlets/purl/870201.
@article{osti_870201,
title = {Fabrication of amorphous diamond films},
author = {Falabella, Steven},
abstractNote = {Amorphous diamond films having a significant reduction in intrinsic stress are prepared by biasing a substrate to be coated and depositing carbon ions thereon under controlled temperature conditions.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {1}
}

Works referenced in this record:

Diamond and diamond-like phases
journal, August 1991


Internal stress reduction by nitrogen incorporation in hard amorphous carbon thin films
journal, June 1992


Structure and bonding studies of the C:N thin films produced by rf sputtering method
journal, November 1990


Compressive-stress-induced formation of thin-film tetrahedral amorphous carbon
journal, August 1991