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Title: Permanent laser conditioning of thin film optical materials

The invention comprises a method for producing optical thin films with a high laser damage threshold and the resulting thin films. The laser damage threshold of the thin films is permanently increased by irradiating the thin films with a fluence below an unconditioned laser damage threshold.
 [1];  [2];  [3];  [4];  [3]
  1. (Palo Alto, CA)
  2. (Pleasanton, CA)
  3. (Livermore, CA)
  4. (Tracy, CA)
Issue Date:
OSTI Identifier:
United States of America as represented by United States (Washington, DC) LLNL
Patent Number(s):
US 5472748
Contract Number:
Research Org:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Country of Publication:
United States
permanent; laser; conditioning; film; optical; materials; comprises; method; producing; films; damage; threshold; resulting; permanently; increased; irradiating; fluence; below; unconditioned; damage threshold; optical materials; producing optical; laser damage; age threshold; /427/