Permanent laser conditioning of thin film optical materials
Abstract
The invention comprises a method for producing optical thin films with a high laser damage threshold and the resulting thin films. The laser damage threshold of the thin films is permanently increased by irradiating the thin films with a fluence below an unconditioned laser damage threshold.
- Inventors:
-
- Palo Alto, CA
- Pleasanton, CA
- Livermore, CA
- Tracy, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 870191
- Patent Number(s):
- 5472748
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C03 - GLASS C03C - CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- permanent; laser; conditioning; film; optical; materials; comprises; method; producing; films; damage; threshold; resulting; permanently; increased; irradiating; fluence; below; unconditioned; damage threshold; optical materials; producing optical; laser damage; age threshold; /427/
Citation Formats
Wolfe, C Robert, Kozlowski, Mark R, Campbell, John H, Staggs, Michael, and Rainer, Frank. Permanent laser conditioning of thin film optical materials. United States: N. p., 1995.
Web.
Wolfe, C Robert, Kozlowski, Mark R, Campbell, John H, Staggs, Michael, & Rainer, Frank. Permanent laser conditioning of thin film optical materials. United States.
Wolfe, C Robert, Kozlowski, Mark R, Campbell, John H, Staggs, Michael, and Rainer, Frank. Sun .
"Permanent laser conditioning of thin film optical materials". United States. https://www.osti.gov/servlets/purl/870191.
@article{osti_870191,
title = {Permanent laser conditioning of thin film optical materials},
author = {Wolfe, C Robert and Kozlowski, Mark R and Campbell, John H and Staggs, Michael and Rainer, Frank},
abstractNote = {The invention comprises a method for producing optical thin films with a high laser damage threshold and the resulting thin films. The laser damage threshold of the thin films is permanently increased by irradiating the thin films with a fluence below an unconditioned laser damage threshold.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sun Jan 01 00:00:00 EST 1995},
month = {Sun Jan 01 00:00:00 EST 1995}
}
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.
Works referenced in this record:
The effect of baking and pulsed laser irradiation on the bulk laser damage threshold of potassium dihydrogen phosphate crystals
journal, July 1982
- Swain, J. E.; Stokowski, S. E.; Milam, D.
- Applied Physics Letters, Vol. 41, Issue 1
Temporary laser damage threshold enhancement by laser conditioning of antireflectionâcoated glass
journal, August 1987
- Frink, M. E.; Arenberg, J. W.; Mordaunt, D. W.
- Applied Physics Letters, Vol. 51, Issue 6
The Properties of Laser Annealed Dielectric Films
book,
- Stewart, A. F.; Guenther, A. H.; Domann, F. E.
- Laser Induced Damage in Optical Materials: 1987