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Title: Optical processing furnace with quartz muffle and diffuser plate

Abstract

An optical furnace for annealing a process wafer comprising a source of optical energy, a quartz muffle having a door to hold the wafer for processing, and a quartz diffuser plate to diffuse the light impinging on the quartz muffle; a feedback system with a light sensor located in the door or wall of the muffle is also provided for controlling the source of optical energy. The quartz for the diffuser plate is surface etched (to give the quartz diffusive qualities) in the furnace during a high intensity burn-in process.

Inventors:
 [1]
  1. Denver, CO
Issue Date:
Research Org.:
National Renewable Energy Lab. (NREL), Golden, CO (United States)
OSTI Identifier:
870076
Patent Number(s):
5452396
Assignee:
Midwest Research Institute (Kansas City, MO)
DOE Contract Number:  
AC02-83CII10093
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
optical; processing; furnace; quartz; muffle; diffuser; plate; annealing; process; wafer; comprising; source; energy; door; hold; diffuse; light; impinging; feedback; sensor; located; wall; provided; controlling; surface; etched; diffusive; qualities; intensity; burn-in; quartz muffle; diffuser plate; light sensor; optical energy; optical furnace; optical processing; quartz diffuser; light impinging; wafer comprising; optical process; processing furnace; process wafer; /438/118/216/219/250/359/392/427/

Citation Formats

Sopori, Bhushan L. Optical processing furnace with quartz muffle and diffuser plate. United States: N. p., 1995. Web.
Sopori, Bhushan L. Optical processing furnace with quartz muffle and diffuser plate. United States.
Sopori, Bhushan L. Sun . "Optical processing furnace with quartz muffle and diffuser plate". United States. https://www.osti.gov/servlets/purl/870076.
@article{osti_870076,
title = {Optical processing furnace with quartz muffle and diffuser plate},
author = {Sopori, Bhushan L},
abstractNote = {An optical furnace for annealing a process wafer comprising a source of optical energy, a quartz muffle having a door to hold the wafer for processing, and a quartz diffuser plate to diffuse the light impinging on the quartz muffle; a feedback system with a light sensor located in the door or wall of the muffle is also provided for controlling the source of optical energy. The quartz for the diffuser plate is surface etched (to give the quartz diffusive qualities) in the furnace during a high intensity burn-in process.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {1}
}

Patent:

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