Optical processing furnace with quartz muffle and diffuser plate
Abstract
An optical furnace for annealing a process wafer comprising a source of optical energy, a quartz muffle having a door to hold the wafer for processing, and a quartz diffuser plate to diffuse the light impinging on the quartz muffle; a feedback system with a light sensor located in the door or wall of the muffle is also provided for controlling the source of optical energy. The quartz for the diffuser plate is surface etched (to give the quartz diffusive qualities) in the furnace during a high intensity burn-in process.
- Inventors:
-
- Denver, CO
- Issue Date:
- Research Org.:
- National Renewable Energy Laboratory (NREL), Golden, CO (United States)
- OSTI Identifier:
- 870076
- Patent Number(s):
- 5452396
- Assignee:
- Midwest Research Institute (Kansas City, MO)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05B - ELECTRIC HEATING
- DOE Contract Number:
- AC02-83CII10093
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- optical; processing; furnace; quartz; muffle; diffuser; plate; annealing; process; wafer; comprising; source; energy; door; hold; diffuse; light; impinging; feedback; sensor; located; wall; provided; controlling; surface; etched; diffusive; qualities; intensity; burn-in; quartz muffle; diffuser plate; light sensor; optical energy; optical furnace; optical processing; quartz diffuser; light impinging; wafer comprising; optical process; processing furnace; process wafer; /438/118/216/219/250/359/392/427/
Citation Formats
Sopori, Bhushan L. Optical processing furnace with quartz muffle and diffuser plate. United States: N. p., 1995.
Web.
Sopori, Bhushan L. Optical processing furnace with quartz muffle and diffuser plate. United States.
Sopori, Bhushan L. Sun .
"Optical processing furnace with quartz muffle and diffuser plate". United States. https://www.osti.gov/servlets/purl/870076.
@article{osti_870076,
title = {Optical processing furnace with quartz muffle and diffuser plate},
author = {Sopori, Bhushan L},
abstractNote = {An optical furnace for annealing a process wafer comprising a source of optical energy, a quartz muffle having a door to hold the wafer for processing, and a quartz diffuser plate to diffuse the light impinging on the quartz muffle; a feedback system with a light sensor located in the door or wall of the muffle is also provided for controlling the source of optical energy. The quartz for the diffuser plate is surface etched (to give the quartz diffusive qualities) in the furnace during a high intensity burn-in process.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {1}
}