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Title: Optical processing furnace with quartz muffle and diffuser plate

An optical furnace for annealing a process wafer comprising a source of optical energy, a quartz muffle having a door to hold the wafer for processing, and a quartz diffuser plate to diffuse the light impinging on the quartz muffle; a feedback system with a light sensor located in the door or wall of the muffle is also provided for controlling the source of optical energy. The quartz for the diffuser plate is surface etched (to give the quartz diffusive qualities) in the furnace during a high intensity burn-in process.
Inventors:
 [1]
  1. (Denver, CO)
Issue Date:
OSTI Identifier:
870076
Assignee:
Midwest Research Institute (Kansas City, MO) NREL
Patent Number(s):
US 5452396
Contract Number:
AC02-83CII10093
Research Org:
National Renewable Energy Lab. (NREL), Golden, CO (United States)
Country of Publication:
United States
Language:
English
Subject:
optical; processing; furnace; quartz; muffle; diffuser; plate; annealing; process; wafer; comprising; source; energy; door; hold; diffuse; light; impinging; feedback; sensor; located; wall; provided; controlling; surface; etched; diffusive; qualities; intensity; burn-in; quartz muffle; diffuser plate; light sensor; optical energy; optical furnace; optical processing; quartz diffuser; light impinging; wafer comprising; optical process; processing furnace; process wafer; /438/118/216/219/250/359/392/427/