Controlled removal of ceramic surfaces with combination of ions implantation and ultrasonic energy

Boatner, Lynn A; Rankin, Janet; Thevenard, Paul; Romana, Laurence J

Title: Controlled removal of ceramic surfaces with combination of ions implantation and ultrasonic energy

Full Record
Other Related Research

Abstract

A method for tailoring or patterning the surface of ceramic articles is provided by implanting ions to predetermined depth into the ceramic material at a selected surface location with the ions being implanted at a fluence and energy adequate to damage the lattice structure of the ceramic material for bi-axially straining near-surface regions of the ceramic material to the predetermined depth. The resulting metastable near-surface regions of the ceramic material are then contacted with energy pulses from collapsing, ultrasonically-generated cavitation bubbles in a liquid medium for removing to a selected depth the ion-damaged near-surface regions containing the bi-axially strained lattice structure from the ceramic body. Additional patterning of the selected surface location on the ceramic body is provided by implanting a high fluence of high-energy, relatively-light ions at selected surface sites for relaxing the bi-axial strain in the near-surface regions defined by these sites and thereby preventing the removal of such ion-implanted sites by the energy pulses from the collapsing ultrasonic cavitation bubbles.

Inventors:

Boatner, Lynn A ^[1]; Rankin, Janet ^[2]; Thevenard, Paul ^[3]; Romana, Laurence J ^[4]

Oak Ridge, TN
Providence, RI
Caluire, FR
Gaudeloupe Antilles, FR

Issue Date:: 1995-01-01

Research Org.:: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

OSTI Identifier:: 870008

Patent Number(s):: 5437729

Assignee:: Martin Marietta Energy Systems, Inc. (Oak Ridge, TN)

Patent Classifications (CPCs):: B - PERFORMING OPERATIONS B08 - CLEANING B08B - CLEANING IN GENERAL

C - CHEMISTRY C04 - CEMENTS C04B - LIME, MAGNESIA

Show more

B - PERFORMING OPERATIONS B08 - CLEANING B08B - CLEANING IN GENERAL
B08B3/12 - by sonic or ultrasonic vibrations

C - CHEMISTRY C04 - CEMENTS C04B - LIME, MAGNESIA
C04B35/00 - Shaped ceramic products characterised by their composition {
C04B40/0021 - {Sonic or ultrasonic waves, e.g. to initiate sonochemical reactions}
C04B41/0027 - {Ion-implantation, ion-irradiation or ion-injection}
C04B41/009 - {characterised by the material treated}
C04B41/53 - involving the removal of at least part of the materials of the treated article, {e.g. etching, drying of hardened concrete
C04B41/91 - involving the removal of part of the materials of the treated articles, e.g. etching

C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C14/48 - Ion implantation

Show less

DOE Contract Number:: AC05-84OR21400

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: controlled; removal; ceramic; surfaces; combination; implantation; ultrasonic; energy; method; tailoring; patterning; surface; articles; provided; implanting; predetermined; depth; material; selected; location; implanted; fluence; adequate; damage; lattice; structure; bi-axially; straining; near-surface; regions; resulting; metastable; contacted; pulses; collapsing; ultrasonically-generated; cavitation; bubbles; liquid; medium; removing; ion-damaged; containing; strained; additional; high-energy; relatively-light; sites; relaxing; bi-axial; strain; defined; preventing; ion-implanted; selected surface; regions containing; surface region; ceramic article; ultrasonic energy; ceramic material; near-surface regions; ceramic articles; lattice structure; liquid medium; ultrasonic cavitation; surface location; predetermined depth; near-surface region; energy pulse; energy pulses; ceramic surface; ceramic surfaces; surface regions; ceramic mater; /134/216/427/

Citation Formats


                    Boatner, Lynn A, Rankin, Janet, Thevenard, Paul, and Romana, Laurence J. Controlled removal of ceramic surfaces with combination of ions implantation and ultrasonic energy.  United States: N. p., 1995. 
        Web.

Copy to clipboard


                    Boatner, Lynn A, Rankin, Janet, Thevenard, Paul, & Romana, Laurence J. Controlled removal of ceramic surfaces with combination of ions implantation and ultrasonic energy.  United States.

Copy to clipboard


                    Boatner, Lynn A, Rankin, Janet, Thevenard, Paul, and Romana, Laurence J. Sun .  
        "Controlled removal of ceramic surfaces with combination of ions implantation and ultrasonic energy".  United States.  https://www.osti.gov/servlets/purl/870008.

Copy to clipboard


                    
@article{osti_870008,

  title        = {Controlled removal of ceramic surfaces with combination of ions implantation and ultrasonic energy},

  author       = {Boatner, Lynn A and Rankin, Janet and Thevenard, Paul and Romana, Laurence J},

  abstractNote = {A method for tailoring or patterning the surface of ceramic articles is provided by implanting ions to predetermined depth into the ceramic material at a selected surface location with the ions being implanted at a fluence and energy adequate to damage the lattice structure of the ceramic material for bi-axially straining near-surface regions of the ceramic material to the predetermined depth. The resulting metastable near-surface regions of the ceramic material are then contacted with energy pulses from collapsing, ultrasonically-generated cavitation bubbles in a liquid medium for removing to a selected depth the ion-damaged near-surface regions containing the bi-axially strained lattice structure from the ceramic body. Additional patterning of the selected surface location on the ceramic body is provided by implanting a high fluence of high-energy, relatively-light ions at selected surface sites for relaxing the bi-axial strain in the near-surface regions defined by these sites and thereby preventing the removal of such ion-implanted sites by the energy pulses from the collapsing ultrasonic cavitation bubbles.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1995},

  month        = {1}

}

Copy to clipboard

Patent:

Save / Share:

Export Metadata

Save to My Library

Similar Records in DOE Patents and OSTI.GOV collections:

Photosensitivity enhancement of PLZT ceramics by positive ion implantation

Patent Land, Cecil E [Albuquerque, NM]; Peercy, Paul S [Albuquerque, NM]

The photosensitivity of lead lanthanum zirconate titanate (PLZT) ceramic material used in high resolution, high contrast, and non-volatile photoferroelectric image storage and display devices is enhanced significantly by positive ion implantation of the PLZT near its surface. Implanted ions include H.sup.+, He.sup.+, Ne.sup.+, Ar.sup.+, as well as chemically reactive ions from Fe, Cr, and Al. The positive ion implantation advantageously serves to shift the absorption characteristics of the PLZT material from near-UV light to visible light. As a result, photosensitivity enhancement is such that the positive ion implanted PLZT plate is sensitive even to sunlight and conventional room lighting, suchmore » « less
Full Text Available
Ion implantation method for preparing polymers having oxygen erosion resistant surfaces

Patent Lee, Eal H [Oak Ridge, TN]; Mansur, Louis K [Clinton, TN]; Heatherly, Jr., Lee (Jacksboro, TN)

Hard surfaced polymers and the method for making them are generally described. Polymers are subjected to simultaneous multiple ion beam bombardment, that results in a hardening of the surface, improved wear resistance, and improved oxygen erosion resistance.
Full Text Available
Method For Plasma Source Ion Implantation And Deposition For Cylindrical Surfaces

Patent Fetherston, Robert P. (Madison, WI), Shamim, Muhammad M. (Madison, WI), Conrad, John R. (Madison, WI)

Uniform ion implantation and deposition onto cylindrical surfaces is achieved by placing a cylindrical electrode in coaxial and conformal relation to the target surface. For implantation and deposition of an inner bore surface the electrode is placed inside the target. For implantation and deposition on an outer cylindrical surface the electrode is placed around the outside of the target. A plasma is generated between the electrode and the target cylindrical surface. Applying a pulse of high voltage to the target causes ions from the plasma to be driven onto the cylindrical target surface. The plasma contained in the space betweenmore » « less
Full Text Available
Controlled ion implant damage profile for etching

Patent Arnold, Jr., George W. (Tijeras, NM); Ashby, Carol I. H. [Edgewood, NM]; Brannon, Paul J [Albuquerque, NM]

A process for etching a material such as LiNbO.sub.3 by implanting ions having a plurality of different kinetic energies in an area to be etched, and then contacting the ion implanted area with an etchant. The various energies of the ions are selected to produce implant damage substantially uniformly throughout the entire depth of the zone to be etched, thus tailoring the vertical profile of the damaged zone.
Full Text Available
Implantable devices having ceramic coating applied via an atomic layer deposition method

Patent Liang, Xinhua; Weimer, Alan W.; Bryant, Stephanie J.

Substrates coated with films of a ceramic material such as aluminum oxides and titanium oxides are biocompatible, and can be used in a variety of applications in which they are implanted in a living body. The substrate is preferably a porous polymer, and may be biodegradable. An important application for the ceramic-coated substrates is as a tissue engineering scaffold for forming artificial tissue.
Full Text Available

Similar Records