Method for simultaneously coating a plurality of filaments

Miller, Paul A; Pochan, Paul D; Siegal, Michael P; Dominguez, Frank

Title: Method for simultaneously coating a plurality of filaments

Abstract

Methods and apparatuses for coating materials, and the products and compositions produced thereby. Substances, such as diamond or diamond-like carbon, are deposited onto materials, such as a filament or a plurality of filaments simultaneously, using one or more cylindrical, inductively coupled, resonator plasma reactors.

Inventors:

Miller, Paul A ^[1]; Pochan, Paul D ^[2]; Siegal, Michael P ^[3]; Dominguez, Frank ^[4]

1004 Matia Ct. NE., Albuquerque, NM 87123
3308 Morris St. NE., #11, Albuquerque, NM 87111
9900 Spain NE., Apt. W-2123, Albuquerque, NM 87111
11341 Academy Ridge Rd. NE., Albuquerque, NM 87111

Issue Date:: 1995-01-01

Research Org.:: AT&T

OSTI Identifier:: 869970

Patent Number(s):: 5431968

Assignee:: Miller, Paul A. (1004 Matia Ct. NE., Albuquerque, NM 87123);Pochan, Paul D. (3308 Morris St. NE., #11, Albuquerque, NM 87111);Siegal, Michael P. (9900 Spain NE., Apt. W-2123, Albuquerque, NM 87111);Dominguez, Frank (11341 Academy Ridge Rd. NE., Albuquerque, NM 87111)

Patent Classifications (CPCs):: C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL

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C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C16/0281 - {of metallic sub-layers
C23C16/26 - Deposition of carbon only
C23C16/545 - {for coating elongated substrates}
C23C16/507 - using external electrodes, e.g. in tunnel type reactors

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DOE Contract Number:: AC04-76DP00789

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: method; simultaneously; coating; plurality; filaments; methods; apparatuses; materials; products; compositions; produced; substances; diamond; diamond-like; carbon; deposited; filament; cylindrical; inductively; coupled; resonator; plasma; reactors; coating material; diamond-like carbon; inductively coupled; plasma reactor; compositions produce; /427/

Citation Formats


                    Miller, Paul A, Pochan, Paul D, Siegal, Michael P, and Dominguez, Frank. Method for simultaneously coating a plurality of filaments.  United States: N. p., 1995. 
        Web.

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                    Miller, Paul A, Pochan, Paul D, Siegal, Michael P, & Dominguez, Frank. Method for simultaneously coating a plurality of filaments.  United States.

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                    Miller, Paul A, Pochan, Paul D, Siegal, Michael P, and Dominguez, Frank. Sun .  
        "Method for simultaneously coating a plurality of filaments".  United States.  https://www.osti.gov/servlets/purl/869970.

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@article{osti_869970,

  title        = {Method for simultaneously coating a plurality of filaments},

  author       = {Miller, Paul A and Pochan, Paul D and Siegal, Michael P and Dominguez, Frank},

  abstractNote = {Methods and apparatuses for coating materials, and the products and compositions produced thereby. Substances, such as diamond or diamond-like carbon, are deposited onto materials, such as a filament or a plurality of filaments simultaneously, using one or more cylindrical, inductively coupled, resonator plasma reactors.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1995},

  month        = {1}

}

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Works referenced in this record:

Application of a low-pressure radio frequency discharge source to polysilicon gate etching
journal, January 1990

Cook, J. M.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 8, Issue 1
https://doi.org/10.1116/1.584859

Direct deposition of polycrystalline diamond films on Si(100) without surface pretreatment
journal, August 1991

Rudder, R. A.; Hudson, G. C.; Posthill, J. B.
Applied Physics Letters, Vol. 59, Issue 7
https://doi.org/10.1063/1.105344

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Title: Method for simultaneously coating a plurality of filaments

Abstract

Citation Formats

Application of a low-pressure radio frequency discharge source to polysilicon gate etching journal, January 1990

Direct deposition of polycrystalline diamond films on Si(100) without surface pretreatment journal, August 1991

Application of a low-pressure radio frequency discharge source to polysilicon gate etching
journal, January 1990

Direct deposition of polycrystalline diamond films on Si(100) without surface pretreatment
journal, August 1991