Method of forming a plasma sprayed interconnection layer on an electrode of an electrochemical cell
Abstract
A dense, substantially gas-tight, electrically conductive interconnection layer is formed on an air electrode structure of an electrochemical cell by (A) providing an electrode surface; (B) forming on a selected portion of the electrode surface, a layer of doped LaCrO.sub.3 particles doped with an element selected from Ca, Sr, Ba, Mg, Co, Ni, Al and mixtures thereof by plasma spraying doped LaCrO.sub.3 powder, preferably compensated with chromium as Cr.sub.2 O.sub.3 and/or dopant element, preferably by plasma arc spraying; and, (C) heating the doped and compensated LaCrO.sub.3 layer to about 1100.degree. C. to 1300.degree. C. to provide a dense, substantially gas-tight, substantially hydration-free, electrically conductive interconnection material bonded to the electrode surface. A solid electrolyte layer can be applied to the unselected portion of the air electrode, and a fuel electrode can be applied to the solid electrolyte, to provide an electrochemical cell.
- Inventors:
-
- Murrysville, PA
- Lower Burrell, PA
- Monroeville, PA
- Anyola, IN
- Issue Date:
- Research Org.:
- Westinghouse Electric Corp., Pittsburgh, PA (United States)
- OSTI Identifier:
- 869936
- Patent Number(s):
- 5426003
- Assignee:
- Westinghouse Electric Corporation (Pittsburgh, PA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01M - PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- DOE Contract Number:
- FC21-91MC28055
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- method; forming; plasma; sprayed; interconnection; layer; electrode; electrochemical; cell; dense; substantially; gas-tight; electrically; conductive; formed; air; structure; providing; surface; selected; portion; doped; lacro; particles; element; sr; mg; mixtures; spraying; powder; preferably; compensated; chromium; dopant; heating; 1100; degree; 1300; provide; hydration-free; material; bonded; solid; electrolyte; applied; unselected; fuel; substantially gas-tight; material bonded; interconnection layer; electrolyte layer; plasma spray; electrode structure; air electrode; electrochemical cell; electrically conductive; solid electrolyte; plasma spraying; element selected; fuel electrode; electrode surface; interconnection material; conductive interconnection; selected portion; plasma sprayed; doped lacro; sprayed interconnection; dopant element; conductive interconnect; /429/29/427/
Citation Formats
Spengler, Charles J, Folser, George R, Vora, Shailesh D, Kuo, Lewis, and Richards, Von L. Method of forming a plasma sprayed interconnection layer on an electrode of an electrochemical cell. United States: N. p., 1995.
Web.
Spengler, Charles J, Folser, George R, Vora, Shailesh D, Kuo, Lewis, & Richards, Von L. Method of forming a plasma sprayed interconnection layer on an electrode of an electrochemical cell. United States.
Spengler, Charles J, Folser, George R, Vora, Shailesh D, Kuo, Lewis, and Richards, Von L. Sun .
"Method of forming a plasma sprayed interconnection layer on an electrode of an electrochemical cell". United States. https://www.osti.gov/servlets/purl/869936.
@article{osti_869936,
title = {Method of forming a plasma sprayed interconnection layer on an electrode of an electrochemical cell},
author = {Spengler, Charles J and Folser, George R and Vora, Shailesh D and Kuo, Lewis and Richards, Von L},
abstractNote = {A dense, substantially gas-tight, electrically conductive interconnection layer is formed on an air electrode structure of an electrochemical cell by (A) providing an electrode surface; (B) forming on a selected portion of the electrode surface, a layer of doped LaCrO.sub.3 particles doped with an element selected from Ca, Sr, Ba, Mg, Co, Ni, Al and mixtures thereof by plasma spraying doped LaCrO.sub.3 powder, preferably compensated with chromium as Cr.sub.2 O.sub.3 and/or dopant element, preferably by plasma arc spraying; and, (C) heating the doped and compensated LaCrO.sub.3 layer to about 1100.degree. C. to 1300.degree. C. to provide a dense, substantially gas-tight, substantially hydration-free, electrically conductive interconnection material bonded to the electrode surface. A solid electrolyte layer can be applied to the unselected portion of the air electrode, and a fuel electrode can be applied to the solid electrolyte, to provide an electrochemical cell.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {1}
}