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Title: Process for depositing Cr-bearing layer

A method of applying a Cr-bearing layer to a substrate, comprises introducing an organometallic compound, in vapor or solid powder form entrained in a carrier gas to a plasma of an inductively coupled plasma torch or device to thermally decompose the organometallic compound and contacting the plasma and the substrate to be coated so as to deposit the Cr-bearing layer on the substrate. A metallic Cr, Cr alloy or Cr compound such as chromium oxide, nitride and carbide can be provided on the substrate. Typically, the organometallic compound is introduced to an inductively coupled plasma torch that is disposed in ambient air so to thermally decompose the organometallic compound in the plasma. The plasma is directed at the substrate to deposit the Cr-bearing layer or coating on the substrate.
 [1];  [1];  [2]
  1. (Ames, IA)
  2. (Kentwood, MI)
Issue Date:
OSTI Identifier:
Iowa State University Research Foundation, Inc. (Ames, IA) AMES
Patent Number(s):
US 5413821
Application Number:
Contract Number:
Research Org:
Ames Laboratory (AMES), Ames, IA; Iowa State University, Ames, IA (US)
Country of Publication:
United States
process; depositing; cr-bearing; layer; method; applying; substrate; comprises; introducing; organometallic; compound; vapor; solid; powder; form; entrained; carrier; gas; plasma; inductively; coupled; torch; device; thermally; decompose; contacting; coated; deposit; metallic; alloy; chromium; oxide; nitride; carbide; provided; typically; introduced; disposed; ambient; air; directed; coating; comprises introducing; inductively coupled; ambient air; carrier gas; plasma torch; coupled plasma; chromium oxide; powder form; organometallic compound; solid powder; thermally decompose; cr-bearing layer; metallic compound; /427/