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Title: Photon beam position monitor

Abstract

A photon beam position monitor for use in the front end of a beamline of a high heat flux and high energy photon source such as a synchrotron radiation storage ring detects and measures the position and, when a pair of such monitors are used in tandem, the slope of a photon beam emanating from an insertion device such as a wiggler or an undulator inserted in the straight sections of the ring. The photon beam position monitor includes a plurality of spaced blades for precisely locating the photon beam, with each blade comprised of chemical vapor deposition (CVD) diamond with an outer metal coating of a photon sensitive metal such as tungsten, molybdenum, etc., which combination emits electrons when a high energy photon beam is incident upon the blade. Two such monitors are contemplated for use in the front end of the beamline, with the two monitors having vertically and horizontally offset detector blades to avoid blade "shadowing". Provision is made for aligning the detector blades with the photon beam and limiting detector blade temperature during operation.

Inventors:
 [1];  [2]
  1. Naperville, IL
  2. Darien, IL
Issue Date:
Research Org.:
Argonne National Laboratory (ANL), Argonne, IL
OSTI Identifier:
869742
Patent Number(s):
5387795
Assignee:
University of Chicago (Chicago, IL)
DOE Contract Number:  
W-31109-ENG-38
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
photon; beam; position; monitor; front; beamline; heat; flux; energy; source; synchrotron; radiation; storage; detects; measures; pair; monitors; tandem; slope; emanating; insertion; device; wiggler; undulator; inserted; straight; sections; plurality; spaced; blades; precisely; locating; blade; comprised; chemical; vapor; deposition; cvd; diamond; outer; metal; coating; sensitive; tungsten; molybdenum; etc; combination; emits; electrons; incident; contemplated; vertically; horizontally; offset; detector; avoid; shadowing; provision; aligning; limiting; temperature; operation; beam position; position monitor; heat flux; chemical vapor; vapor deposition; metal coating; outer metal; photon beam; synchrotron radiation; beam emanating; straight section; energy photon; insertion device; photon source; photon sensitive; spaced blade; /250/324/

Citation Formats

Kuzay, Tuncer M, and Shu, Deming. Photon beam position monitor. United States: N. p., 1995. Web.
Kuzay, Tuncer M, & Shu, Deming. Photon beam position monitor. United States.
Kuzay, Tuncer M, and Shu, Deming. Sun . "Photon beam position monitor". United States. https://www.osti.gov/servlets/purl/869742.
@article{osti_869742,
title = {Photon beam position monitor},
author = {Kuzay, Tuncer M and Shu, Deming},
abstractNote = {A photon beam position monitor for use in the front end of a beamline of a high heat flux and high energy photon source such as a synchrotron radiation storage ring detects and measures the position and, when a pair of such monitors are used in tandem, the slope of a photon beam emanating from an insertion device such as a wiggler or an undulator inserted in the straight sections of the ring. The photon beam position monitor includes a plurality of spaced blades for precisely locating the photon beam, with each blade comprised of chemical vapor deposition (CVD) diamond with an outer metal coating of a photon sensitive metal such as tungsten, molybdenum, etc., which combination emits electrons when a high energy photon beam is incident upon the blade. Two such monitors are contemplated for use in the front end of the beamline, with the two monitors having vertically and horizontally offset detector blades to avoid blade "shadowing". Provision is made for aligning the detector blades with the photon beam and limiting detector blade temperature during operation.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {1}
}

Patent:

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