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Title: Method for continuous control of composition and doping of pulsed laser deposited films

A method for growing a deposit upon a substrate of semiconductor material involves the utilization of pulsed laser deposition techniques within a low-pressure gas environment. The substrate and a target of a first material are positioned within a deposition chamber and a low-pressure gas atmosphere is developed within the chamber. The substrate is then heated, and the target is irradiated, so that atoms of the target material are ablated from the remainder of the target, while atoms of the gas simultaneously are adsorbed on the substrate/film surface. The ablated atoms build up upon the substrate, together with the adsorbed gas atoms to form the thin-film deposit on the substrate. By controlling the pressure of the gas of the chamber atmosphere, the composition of the formed deposit can be controlled, and films of continuously variable composition or doping can be grown from a single target of fixed composition.
Inventors:
 [1];  [1]
  1. (Knoxville, TN)
Issue Date:
OSTI Identifier:
869735
Assignee:
Martin Marietta Energy Systems, Inc. (Oak Ridge, TN) ORNL
Patent Number(s):
US 5386798
Research Org:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN
Country of Publication:
United States
Language:
English
Subject:
method; continuous; control; composition; doping; pulsed; laser; deposited; films; growing; deposit; substrate; semiconductor; material; involves; utilization; deposition; techniques; low-pressure; gas; environment; target; positioned; chamber; atmosphere; developed; heated; irradiated; atoms; ablated; remainder; simultaneously; adsorbed; film; surface; build; form; thin-film; controlling; pressure; formed; controlled; continuously; variable; grown; single; fixed; gas environment; low-pressure gas; deposition chamber; pressure gas; semiconductor material; pulsed laser; gas atmosphere; target material; deposition techniques; continuously variable; deposited films; gas atoms; laser deposition; single target; film surface; deposition technique; deposited film; thin-film deposit; target mater; adsorbed gas; material involves; laser deposited; continuous control; /117/148/

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