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Title: Fabrication process for a gradient index x-ray lens

Abstract

A process for fabricating high efficiency x-ray lenses that operate in the 0.5-4.0 keV region suitable for use in biological imaging, surface science, and x-ray lithography of integrated circuits. The gradient index x-ray optics fabrication process broadly involves co-sputtering multi-layers of film on a wire, followed by slicing and mounting on block, and then ion beam thinning to a thickness determined by periodic testing for efficiency. The process enables the fabrication of transmissive gradient index x-ray optics for the 0.5-4.0 keV energy range. This process allows the fabrication of optical elements for the next generation of imaging and x-ray lithography instruments m the soft x-ray region.

Inventors:
 [1];  [1];  [1]
  1. Livermore, CA
Issue Date:
Research Org.:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
OSTI Identifier:
869707
Patent Number(s):
5382342
Assignee:
United States of America as represented by Department of Energy (Washington, DC)
Patent Classifications (CPCs):
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
G - PHYSICS G21 - NUCLEAR PHYSICS G21K - TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
fabrication; process; gradient; index; x-ray; lens; fabricating; efficiency; lenses; operate; 5-4; kev; region; suitable; biological; imaging; surface; science; lithography; integrated; circuits; optics; broadly; involves; co-sputtering; multi-layers; film; wire; followed; slicing; mounting; block; beam; thinning; thickness; determined; periodic; testing; enables; transmissive; energy; range; allows; optical; elements; generation; instruments; soft; gradient index; x-ray lens; x-ray optics; x-ray lithography; optical element; optical elements; integrated circuits; integrated circuit; soft x-ray; fabrication process; energy range; process enables; process allows; kev energy; kev region; /204/

Citation Formats

Bionta, Richard M, Makowiecki, Daniel M, and Skulina, Kenneth M. Fabrication process for a gradient index x-ray lens. United States: N. p., 1995. Web.
Bionta, Richard M, Makowiecki, Daniel M, & Skulina, Kenneth M. Fabrication process for a gradient index x-ray lens. United States.
Bionta, Richard M, Makowiecki, Daniel M, and Skulina, Kenneth M. Sun . "Fabrication process for a gradient index x-ray lens". United States. https://www.osti.gov/servlets/purl/869707.
@article{osti_869707,
title = {Fabrication process for a gradient index x-ray lens},
author = {Bionta, Richard M and Makowiecki, Daniel M and Skulina, Kenneth M},
abstractNote = {A process for fabricating high efficiency x-ray lenses that operate in the 0.5-4.0 keV region suitable for use in biological imaging, surface science, and x-ray lithography of integrated circuits. The gradient index x-ray optics fabrication process broadly involves co-sputtering multi-layers of film on a wire, followed by slicing and mounting on block, and then ion beam thinning to a thickness determined by periodic testing for efficiency. The process enables the fabrication of transmissive gradient index x-ray optics for the 0.5-4.0 keV energy range. This process allows the fabrication of optical elements for the next generation of imaging and x-ray lithography instruments m the soft x-ray region.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {1}
}

Works referenced in this record:

8 Kev X-Ray Zone Plates
conference, July 1989


Transmission gratings that diffract 8 keV x rays
journal, September 1987


Sputtered-Sliced Linear Zone Plates for 8 keV X-Rays
book, January 1988


Tabletop x-ray microscope using 8 keV zone plates
journal, January 1990


Sputtered-Sliced Multilayers: Zone Plates And Transmission Gratings For 8-kev X Rays
conference, December 1988