Fabrication process for a gradient index x-ray lens
Abstract
A process for fabricating high efficiency x-ray lenses that operate in the 0.5-4.0 keV region suitable for use in biological imaging, surface science, and x-ray lithography of integrated circuits. The gradient index x-ray optics fabrication process broadly involves co-sputtering multi-layers of film on a wire, followed by slicing and mounting on block, and then ion beam thinning to a thickness determined by periodic testing for efficiency. The process enables the fabrication of transmissive gradient index x-ray optics for the 0.5-4.0 keV energy range. This process allows the fabrication of optical elements for the next generation of imaging and x-ray lithography instruments m the soft x-ray region.
- Inventors:
-
- Livermore, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 869707
- Patent Number(s):
- 5382342
- Assignee:
- United States of America as represented by Department of Energy (Washington, DC)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
G - PHYSICS G21 - NUCLEAR PHYSICS G21K - TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- fabrication; process; gradient; index; x-ray; lens; fabricating; efficiency; lenses; operate; 5-4; kev; region; suitable; biological; imaging; surface; science; lithography; integrated; circuits; optics; broadly; involves; co-sputtering; multi-layers; film; wire; followed; slicing; mounting; block; beam; thinning; thickness; determined; periodic; testing; enables; transmissive; energy; range; allows; optical; elements; generation; instruments; soft; gradient index; x-ray lens; x-ray optics; x-ray lithography; optical element; optical elements; integrated circuits; integrated circuit; soft x-ray; fabrication process; energy range; process enables; process allows; kev energy; kev region; /204/
Citation Formats
Bionta, Richard M, Makowiecki, Daniel M, and Skulina, Kenneth M. Fabrication process for a gradient index x-ray lens. United States: N. p., 1995.
Web.
Bionta, Richard M, Makowiecki, Daniel M, & Skulina, Kenneth M. Fabrication process for a gradient index x-ray lens. United States.
Bionta, Richard M, Makowiecki, Daniel M, and Skulina, Kenneth M. Sun .
"Fabrication process for a gradient index x-ray lens". United States. https://www.osti.gov/servlets/purl/869707.
@article{osti_869707,
title = {Fabrication process for a gradient index x-ray lens},
author = {Bionta, Richard M and Makowiecki, Daniel M and Skulina, Kenneth M},
abstractNote = {A process for fabricating high efficiency x-ray lenses that operate in the 0.5-4.0 keV region suitable for use in biological imaging, surface science, and x-ray lithography of integrated circuits. The gradient index x-ray optics fabrication process broadly involves co-sputtering multi-layers of film on a wire, followed by slicing and mounting on block, and then ion beam thinning to a thickness determined by periodic testing for efficiency. The process enables the fabrication of transmissive gradient index x-ray optics for the 0.5-4.0 keV energy range. This process allows the fabrication of optical elements for the next generation of imaging and x-ray lithography instruments m the soft x-ray region.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {1}
}
Works referenced in this record:
8 Kev X-Ray Zone Plates
conference, July 1989
- Bionta, R. M.; Ables, E.; Clamp, O.
- 33rd Annual Techincal Symposium, SPIE Proceedings
Transmission gratings that diffract 8 keV x rays
journal, September 1987
- Bionta, R. M.
- Applied Physics Letters, Vol. 51, Issue 10
Sputtered-Sliced Linear Zone Plates for 8 keV X-Rays
book, January 1988
- Bionta, R. M.; Jankowski, A. F.; Makowiecki, D. M.
- Springer Series in Optical Sciences
Tabletop x-ray microscope using 8 keV zone plates
journal, January 1990
- Bionta, Richard M.
- Optical Engineering, Vol. 29, Issue 6
Sputtered-Sliced Multilayers: Zone Plates And Transmission Gratings For 8-kev X Rays
conference, December 1988
- Bionta, R. M.; Ables, E.; Cook, K. J.
- 32nd Annual Technical Symposium, SPIE Proceedings