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Title: Direct current sputtering of boron from boron/coron mixtures

Abstract

A method for coating a substrate with boron by sputtering includes lowering the electrical resistance of a boron-containing rod to allow electrical conduction in the rod; placing the boron-containing rod inside a vacuum chamber containing substrate material to be coated; applying an electrical potential between the boron target material and the vacuum chamber; countering a current avalanche that commences when the conduction heating rate exceeds the cooling rate, and until a steady equilibrium heating current is reached; and, coating the substrate material with boron by sputtering from the boron-containing rod.

Inventors:
 [1];  [2];  [3]
  1. Allentown, NJ
  2. Williamsburg, VA
  3. Edison, NJ
Issue Date:
Research Org.:
Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ
OSTI Identifier:
869644
Patent Number(s):
5372686
Assignee:
United States of America as represented by United States (Washington, DC)
DOE Contract Number:  
AC02-76CH03073
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
direct; current; sputtering; boron; coron; mixtures; method; coating; substrate; lowering; electrical; resistance; boron-containing; rod; allow; conduction; placing; inside; vacuum; chamber; containing; material; coated; applying; potential; target; countering; avalanche; commences; heating; rate; exceeds; cooling; steady; equilibrium; reached; heating rate; cooling rate; electrical potential; substrate material; direct current; vacuum chamber; electrical resistance; chamber containing; target material; heating current; electrical conduction; target mater; containing substrate; current sputtering; /204/

Citation Formats

Timberlake, John R, Manos, Dennis, and Nartowitz, Ed. Direct current sputtering of boron from boron/coron mixtures. United States: N. p., 1994. Web.
Timberlake, John R, Manos, Dennis, & Nartowitz, Ed. Direct current sputtering of boron from boron/coron mixtures. United States.
Timberlake, John R, Manos, Dennis, and Nartowitz, Ed. Sat . "Direct current sputtering of boron from boron/coron mixtures". United States. https://www.osti.gov/servlets/purl/869644.
@article{osti_869644,
title = {Direct current sputtering of boron from boron/coron mixtures},
author = {Timberlake, John R and Manos, Dennis and Nartowitz, Ed},
abstractNote = {A method for coating a substrate with boron by sputtering includes lowering the electrical resistance of a boron-containing rod to allow electrical conduction in the rod; placing the boron-containing rod inside a vacuum chamber containing substrate material to be coated; applying an electrical potential between the boron target material and the vacuum chamber; countering a current avalanche that commences when the conduction heating rate exceeds the cooling rate, and until a steady equilibrium heating current is reached; and, coating the substrate material with boron by sputtering from the boron-containing rod.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1994},
month = {1}
}

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