Direct current sputtering of boron from boron/coron mixtures
Abstract
A method for coating a substrate with boron by sputtering includes lowering the electrical resistance of a boron-containing rod to allow electrical conduction in the rod; placing the boron-containing rod inside a vacuum chamber containing substrate material to be coated; applying an electrical potential between the boron target material and the vacuum chamber; countering a current avalanche that commences when the conduction heating rate exceeds the cooling rate, and until a steady equilibrium heating current is reached; and, coating the substrate material with boron by sputtering from the boron-containing rod.
- Inventors:
-
- Allentown, NJ
- Williamsburg, VA
- Edison, NJ
- Issue Date:
- Research Org.:
- Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)
- OSTI Identifier:
- 869644
- Patent Number(s):
- 5372686
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
G - PHYSICS G21 - NUCLEAR PHYSICS G21B - FUSION REACTORS
- DOE Contract Number:
- AC02-76CH03073
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- direct; current; sputtering; boron; coron; mixtures; method; coating; substrate; lowering; electrical; resistance; boron-containing; rod; allow; conduction; placing; inside; vacuum; chamber; containing; material; coated; applying; potential; target; countering; avalanche; commences; heating; rate; exceeds; cooling; steady; equilibrium; reached; heating rate; cooling rate; electrical potential; substrate material; direct current; vacuum chamber; electrical resistance; chamber containing; target material; heating current; electrical conduction; target mater; containing substrate; current sputtering; /204/
Citation Formats
Timberlake, John R, Manos, Dennis, and Nartowitz, Ed. Direct current sputtering of boron from boron/coron mixtures. United States: N. p., 1994.
Web.
Timberlake, John R, Manos, Dennis, & Nartowitz, Ed. Direct current sputtering of boron from boron/coron mixtures. United States.
Timberlake, John R, Manos, Dennis, and Nartowitz, Ed. Sat .
"Direct current sputtering of boron from boron/coron mixtures". United States. https://www.osti.gov/servlets/purl/869644.
@article{osti_869644,
title = {Direct current sputtering of boron from boron/coron mixtures},
author = {Timberlake, John R and Manos, Dennis and Nartowitz, Ed},
abstractNote = {A method for coating a substrate with boron by sputtering includes lowering the electrical resistance of a boron-containing rod to allow electrical conduction in the rod; placing the boron-containing rod inside a vacuum chamber containing substrate material to be coated; applying an electrical potential between the boron target material and the vacuum chamber; countering a current avalanche that commences when the conduction heating rate exceeds the cooling rate, and until a steady equilibrium heating current is reached; and, coating the substrate material with boron by sputtering from the boron-containing rod.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1994},
month = {1}
}
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