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Title: Negative ion beam injection apparatus with magnetic shield and electron removal means

Abstract

A negative ion source is constructed to produce H.sup.- ions without using Cesium. A high percentage of secondary electrons that typically accompany the extracted H.sup.- are trapped and eliminated from the beam by permanent magnets in the initial stage of acceleration. Penetration of the magnetic field from the permanent magnets into the ion source is minimized. This reduces the destructive effect the magnetic field could have on negative ion production and extraction from the source. A beam expansion section in the extractor results in a strongly converged final beam.

Inventors:
 [1];  [2];  [3]
+ Show Inventor Affiliations
  1. Berkeley, CA
  2. Hayward, CA
  3. Hercules, CA
Issue Date:
Research Org.:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
OSTI Identifier:
869604
Patent Number(s):
5365070
Assignee:
Regents of University of California (Oakland, CA)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
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DOE Contract Number:  
AC03-76SF00098
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
negative; beam; injection; apparatus; magnetic; shield; electron; removal; means; source; constructed; produce; cesium; percentage; secondary; electrons; typically; accompany; extracted; trapped; eliminated; permanent; magnets; initial; stage; acceleration; penetration; field; minimized; reduces; destructive; effect; production; extraction; expansion; section; extractor; results; strongly; converged; final; beam injection; permanent magnet; magnetic field; permanent magnets; secondary electrons; secondary electron; removal means; injection apparatus; final beam; initial stage; magnetic shield; /250/313/

Citation Formats

Anderson, Oscar A, Chan, Chun F, and Leung, Ka-Ngo. Negative ion beam injection apparatus with magnetic shield and electron removal means. United States: N. p., 1994. Web.
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Anderson, Oscar A, Chan, Chun F, & Leung, Ka-Ngo. Negative ion beam injection apparatus with magnetic shield and electron removal means. United States.
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Anderson, Oscar A, Chan, Chun F, and Leung, Ka-Ngo. Sat . "Negative ion beam injection apparatus with magnetic shield and electron removal means". United States. https://www.osti.gov/servlets/purl/869604.
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@article{osti_869604,
title = {Negative ion beam injection apparatus with magnetic shield and electron removal means},
author = {Anderson, Oscar A and Chan, Chun F and Leung, Ka-Ngo},
abstractNote = {A negative ion source is constructed to produce H.sup.- ions without using Cesium. A high percentage of secondary electrons that typically accompany the extracted H.sup.- are trapped and eliminated from the beam by permanent magnets in the initial stage of acceleration. Penetration of the magnetic field from the permanent magnets into the ion source is minimized. This reduces the destructive effect the magnetic field could have on negative ion production and extraction from the source. A beam expansion section in the extractor results in a strongly converged final beam.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1994},
month = {1}
}
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