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Title: Process for etching mixed metal oxides

Abstract

An etching process using dicarboxylic and tricarboxylic acids as chelating etchants for mixed metal oxide films such as high temperature superconductors and ferroelectric materials. Undesirable differential etching rates between different metal oxides are avoided by selection of the proper acid or combination of acids. Feature sizes below one micron, excellent quality vertical edges, and film thicknesses in the 100 Angstom range may be achieved by this method.

Inventors:
 [1];  [2]
  1. (Edgewood, NM)
  2. (Evergreen, CO)
Issue Date:
Research Org.:
AT & T CORP
OSTI Identifier:
869558
Patent Number(s):
5356516
Assignee:
Sandia Corporation (Albuquerque, NM) SNL
DOE Contract Number:  
AC04-76DP00789
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
process; etching; mixed; metal; oxides; dicarboxylic; tricarboxylic; acids; chelating; etchants; oxide; films; temperature; superconductors; ferroelectric; materials; undesirable; differential; rates; avoided; selection; proper; acid; combination; feature; sizes; below; micron; excellent; quality; vertical; edges; film; thicknesses; 100; angstom; range; achieved; method; temperature superconductors; film thickness; etching process; oxide films; temperature superconductor; mixed metal; metal oxide; metal oxides; oxide film; carboxylic acids; carboxylic acid; feature sizes; ferroelectric material; ferroelectric materials; differential etch; /216/

Citation Formats

Ashby, Carol I. H., and Ginley, David S. Process for etching mixed metal oxides. United States: N. p., 1994. Web.
Ashby, Carol I. H., & Ginley, David S. Process for etching mixed metal oxides. United States.
Ashby, Carol I. H., and Ginley, David S. Sat . "Process for etching mixed metal oxides". United States. https://www.osti.gov/servlets/purl/869558.
@article{osti_869558,
title = {Process for etching mixed metal oxides},
author = {Ashby, Carol I. H. and Ginley, David S.},
abstractNote = {An etching process using dicarboxylic and tricarboxylic acids as chelating etchants for mixed metal oxide films such as high temperature superconductors and ferroelectric materials. Undesirable differential etching rates between different metal oxides are avoided by selection of the proper acid or combination of acids. Feature sizes below one micron, excellent quality vertical edges, and film thicknesses in the 100 Angstom range may be achieved by this method.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1994},
month = {1}
}

Patent:

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