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Title: Control of plasma process by use of harmonic frequency components of voltage and current

Abstract

The present invention provides for a technique for taking advantage of the intrinsic electrical non-linearity of processing plasmas to add additional control variables that affect process performance. The technique provides for the adjustment of the electrical coupling circuitry, as well as the electrical excitation level, in response to measurements of the reactor voltage and current and to use that capability to modify the plasma characteristics to obtain the desired performance.

Inventors:
 [1];  [2]
  1. (Albuquerque, NM)
  2. (Cambridge, MA)
Issue Date:
Research Org.:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA
OSTI Identifier:
869374
Patent Number(s):
5325019
Assignee:
Sematech, Inc. (Austin, TX) SNL
DOE Contract Number:  
FI04-89AL58872
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
control; plasma; process; harmonic; frequency; components; voltage; current; provides; technique; taking; advantage; intrinsic; electrical; non-linearity; processing; plasmas; add; additional; variables; affect; performance; adjustment; coupling; circuitry; excitation; level; response; measurements; reactor; capability; modify; characteristics; obtain; desired; electrical excitation; control variable; control variables; frequency components; plasma process; additional control; taking advantage; frequency component; harmonic frequency; technique provides; process performance; /315/204/

Citation Formats

Miller, Paul A., and Kamon, Mattan. Control of plasma process by use of harmonic frequency components of voltage and current. United States: N. p., 1994. Web.
Miller, Paul A., & Kamon, Mattan. Control of plasma process by use of harmonic frequency components of voltage and current. United States.
Miller, Paul A., and Kamon, Mattan. Sat . "Control of plasma process by use of harmonic frequency components of voltage and current". United States. https://www.osti.gov/servlets/purl/869374.
@article{osti_869374,
title = {Control of plasma process by use of harmonic frequency components of voltage and current},
author = {Miller, Paul A. and Kamon, Mattan},
abstractNote = {The present invention provides for a technique for taking advantage of the intrinsic electrical non-linearity of processing plasmas to add additional control variables that affect process performance. The technique provides for the adjustment of the electrical coupling circuitry, as well as the electrical excitation level, in response to measurements of the reactor voltage and current and to use that capability to modify the plasma characteristics to obtain the desired performance.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1994},
month = {1}
}

Patent:

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