Control of plasma process by use of harmonic frequency components of voltage and current
Abstract
The present invention provides for a technique for taking advantage of the intrinsic electrical non-linearity of processing plasmas to add additional control variables that affect process performance. The technique provides for the adjustment of the electrical coupling circuitry, as well as the electrical excitation level, in response to measurements of the reactor voltage and current and to use that capability to modify the plasma characteristics to obtain the desired performance.
- Inventors:
-
- Albuquerque, NM
- Cambridge, MA
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 869374
- Patent Number(s):
- 5325019
- Assignee:
- Sematech, Inc. (Austin, TX)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- FI04-89AL58872
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- control; plasma; process; harmonic; frequency; components; voltage; current; provides; technique; taking; advantage; intrinsic; electrical; non-linearity; processing; plasmas; add; additional; variables; affect; performance; adjustment; coupling; circuitry; excitation; level; response; measurements; reactor; capability; modify; characteristics; obtain; desired; electrical excitation; control variable; control variables; frequency components; plasma process; additional control; taking advantage; frequency component; harmonic frequency; technique provides; process performance; /315/204/
Citation Formats
Miller, Paul A, and Kamon, Mattan. Control of plasma process by use of harmonic frequency components of voltage and current. United States: N. p., 1994.
Web.
Miller, Paul A, & Kamon, Mattan. Control of plasma process by use of harmonic frequency components of voltage and current. United States.
Miller, Paul A, and Kamon, Mattan. Sat .
"Control of plasma process by use of harmonic frequency components of voltage and current". United States. https://www.osti.gov/servlets/purl/869374.
@article{osti_869374,
title = {Control of plasma process by use of harmonic frequency components of voltage and current},
author = {Miller, Paul A and Kamon, Mattan},
abstractNote = {The present invention provides for a technique for taking advantage of the intrinsic electrical non-linearity of processing plasmas to add additional control variables that affect process performance. The technique provides for the adjustment of the electrical coupling circuitry, as well as the electrical excitation level, in response to measurements of the reactor voltage and current and to use that capability to modify the plasma characteristics to obtain the desired performance.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1994},
month = {1}
}
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