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Title: Method of chemical vapor deposition of boron nitride using polymeric cyanoborane

Abstract

Polymeric cyanoborane is volatilized, decomposed by thermal or microwave plasma energy, and deposited on a substrate as an amorphous film containing boron, nitrogen and carbon. Residual carbon present in the film is removed by ammonia treatment at an increased temperature, producing an adherent, essentially stoichiometric boron nitride film.

Inventors:
 [1]
  1. (Oak Ridge, TN)
Issue Date:
Research Org.:
LOCKHEED MARTIN ENRGY SYST INC
OSTI Identifier:
869353
Patent Number(s):
5320878
Assignee:
Martin Marietta Energy Systems, Inc. (Oak Ridge, TN) ORNL
DOE Contract Number:  
AC05-84OR21400
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
method; chemical; vapor; deposition; boron; nitride; polymeric; cyanoborane; volatilized; decomposed; thermal; microwave; plasma; energy; deposited; substrate; amorphous; film; containing; nitrogen; carbon; residual; removed; ammonia; treatment; increased; temperature; producing; adherent; essentially; stoichiometric; amorphous film; nitride film; chemical vapor; boron nitride; vapor deposition; microwave plasma; residual carbon; film containing; plasma energy; increased temperature; polymeric cyanoborane; containing boron; /427/

Citation Formats

Maya, Leon. Method of chemical vapor deposition of boron nitride using polymeric cyanoborane. United States: N. p., 1994. Web.
Maya, Leon. Method of chemical vapor deposition of boron nitride using polymeric cyanoborane. United States.
Maya, Leon. Sat . "Method of chemical vapor deposition of boron nitride using polymeric cyanoborane". United States. https://www.osti.gov/servlets/purl/869353.
@article{osti_869353,
title = {Method of chemical vapor deposition of boron nitride using polymeric cyanoborane},
author = {Maya, Leon},
abstractNote = {Polymeric cyanoborane is volatilized, decomposed by thermal or microwave plasma energy, and deposited on a substrate as an amorphous film containing boron, nitrogen and carbon. Residual carbon present in the film is removed by ammonia treatment at an increased temperature, producing an adherent, essentially stoichiometric boron nitride film.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1994},
month = {1}
}

Patent:

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