Title: Inclined monochromator for high heat-load synchrotron x-ray radiation

Abstract

A double crystal monochromator including two identical, parallel crystals, each of which is cut such that the normal to the diffraction planes of interest makes an angle less than 90 degrees with the surface normal. Diffraction is symmetric, regardless of whether the crystals are symmetrically or asymmetrically cut, enabling operation of the monochromator with a fixed plane of diffraction. As a result of the inclination of the crystal surface, an incident beam has a footprint area which is elongated both vertically and horizontally when compared to that of the conventional monochromator, reducing the heat flux of the incident beam and enabling more efficient surface cooling. Because after inclination of the crystal only a fraction of thermal distortion lies in the diffraction plane, slope errors and the resultant misorientation of the diffracted beam are reduced.

Inventors:

Khounsary, Ali M ^[1]

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+ Show Inventor Affiliations

1. Lisle, IL

Issue Date:

1994-01-01

Research Org.:

Argonne National Laboratory (ANL), Argonne, IL (United States)

OSTI Identifier:

869165

Patent Number(s):

5287395

Assignee:

United States of America as represented by United States (Washington, DC)

Patent Classifications (CPCs):

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

G - PHYSICS G21 - NUCLEAR PHYSICS G21K - TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR

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G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

G03F7/702 - {Reflective illumination, i.e. reflective optical elements other than folding mirrors}
G03F7/70575 - {Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength, matching of optical components to wavelength}
G03F7/70891 - {Temperature}
G03F7/70983 - {Optical system protection, e.g. pellicles or removable covers for protection of mask}

G - PHYSICS G21 - NUCLEAR PHYSICS G21K - TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR

G21K1/06 - using diffraction, refraction or reflection, e.g. monochromators

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DOE Contract Number:  

W-31109-ENG-38

Resource Type:

Patent

Country of Publication:

United States

Language:

English

Subject:

inclined; monochromator; heat-load; synchrotron; x-ray; radiation; double; crystal; including; identical; parallel; crystals; cut; normal; diffraction; planes; makes; angle; 90; degrees; surface; symmetric; regardless; symmetrically; asymmetrically; enabling; operation; fixed; plane; result; inclination; incident; beam; footprint; elongated; vertically; horizontally; compared; conventional; reducing; heat; flux; efficient; cooling; fraction; thermal; distortion; lies; slope; errors; resultant; misorientation; diffracted; reduced; heat flux; incident beam; x-ray radiation; parallel crystal; ray radiation; diffracted beam; surface normal; crystal surface; crystal monochromator; synchrotron x-ray; thermal distortion; slope error; efficient surface; /378/