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Title: Magnetically attached sputter targets

Abstract

An improved method and assembly for attaching sputtering targets to cathode assemblies of sputtering systems which includes a magnetically permeable material. The magnetically permeable material is imbedded in a target base that is brazed, welded, or soldered to the sputter target, or is mechanically retained in the target material. Target attachment to the cathode is achieved by virtue of the permanent magnets and/or the pole pieces in the cathode assembly that create magnetic flux lines adjacent to the backing plate, which strongly attract the magnetically permeable material in the target assembly.

Inventors:
 [1];  [1]
  1. Livermore, CA
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
869159
Patent Number(s):
5286361
Assignee:
Regents of University of California (Oakland, CA)
Patent Classifications (CPCs):
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
magnetically; attached; sputter; targets; improved; method; assembly; attaching; sputtering; cathode; assemblies; systems; permeable; material; imbedded; target; base; brazed; welded; soldered; mechanically; retained; attachment; achieved; virtue; permanent; magnets; pole; pieces; create; magnetic; flux; lines; adjacent; plate; strongly; attract; permeable material; magnetically permeable; sputtering targets; pole pieces; improved method; magnetic flux; permanent magnet; permanent magnets; target material; sputter target; cathode assembly; target assembly; sputter targets; cathode assemblies; flux line; target mater; pole piece; attached sputter; magnetically attached; /204/

Citation Formats

Makowiecki, Daniel M, and McKernan, Mark A. Magnetically attached sputter targets. United States: N. p., 1994. Web.
Makowiecki, Daniel M, & McKernan, Mark A. Magnetically attached sputter targets. United States.
Makowiecki, Daniel M, and McKernan, Mark A. Sat . "Magnetically attached sputter targets". United States. https://www.osti.gov/servlets/purl/869159.
@article{osti_869159,
title = {Magnetically attached sputter targets},
author = {Makowiecki, Daniel M and McKernan, Mark A},
abstractNote = {An improved method and assembly for attaching sputtering targets to cathode assemblies of sputtering systems which includes a magnetically permeable material. The magnetically permeable material is imbedded in a target base that is brazed, welded, or soldered to the sputter target, or is mechanically retained in the target material. Target attachment to the cathode is achieved by virtue of the permanent magnets and/or the pole pieces in the cathode assembly that create magnetic flux lines adjacent to the backing plate, which strongly attract the magnetically permeable material in the target assembly.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1994},
month = {1}
}

Patent:

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